Sputtering and redeposition of ion irradiated Au nanoparticle arrays: direct comparison of simulations to experiments
Ion beam processing of surfaces is well known to lead to sputtering, which conventionally is associated only with erosion of atoms from the material. We show here, by combination of experiments and a newly developed Monte Carlo algorithm, that in the case of nanoparticles in a regular two-dimensiona...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
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IOP Publishing
2017-01-01
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| Series: | New Journal of Physics |
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| Online Access: | https://doi.org/10.1088/1367-2630/aa56eb |
| _version_ | 1797750937232605184 |
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| author | Henry Holland-Moritz Andrey Ilinov Flyura Djurabekova Kai Nordlund Carsten Ronning |
| author_facet | Henry Holland-Moritz Andrey Ilinov Flyura Djurabekova Kai Nordlund Carsten Ronning |
| author_sort | Henry Holland-Moritz |
| collection | DOAJ |
| description | Ion beam processing of surfaces is well known to lead to sputtering, which conventionally is associated only with erosion of atoms from the material. We show here, by combination of experiments and a newly developed Monte Carlo algorithm, that in the case of nanoparticles in a regular two-dimensional array on surfaces, the redeposition of sputtered atoms may play a significant role on the system development. The simulations are directly compared to in situ experiments obtained using a dual focused Ga ^+ ion beam system and high resolution scanning electron microscopy, and explain the size evolution by a combination of sputtering and redeposition of sputtered material on neighboring particles. The effect is found to be dependent on the size of the nanoparticles: if the nanoparticle size is comparable to the ion range, the reposition is negligible. For larger nanoparticles the redeposition becomes significant and is able to compensate up to 20% of the sputtered material, effectively reducing the process of sputtering. The redeposition may even lead to significant growth: this was seen for the nanoparticles with the sizes much smaller than the ion range. Furthermore, the algorithm shows that significant redeposition is possible when the large size neighboring nanoparticles are present. |
| first_indexed | 2024-03-12T16:40:04Z |
| format | Article |
| id | doaj.art-fcabec6503fa433186a55c40daba59fe |
| institution | Directory Open Access Journal |
| issn | 1367-2630 |
| language | English |
| last_indexed | 2024-03-12T16:40:04Z |
| publishDate | 2017-01-01 |
| publisher | IOP Publishing |
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| series | New Journal of Physics |
| spelling | doaj.art-fcabec6503fa433186a55c40daba59fe2023-08-08T14:34:34ZengIOP PublishingNew Journal of Physics1367-26302017-01-0119101302310.1088/1367-2630/aa56ebSputtering and redeposition of ion irradiated Au nanoparticle arrays: direct comparison of simulations to experimentsHenry Holland-Moritz0Andrey Ilinov1Flyura Djurabekova2Kai Nordlund3https://orcid.org/0000-0001-6244-1942Carsten Ronning4Institute of Solid State Physics, University of Jena , Max-Wien-Platz 1, D-07743 Jena, GermanyDepartment of Physics, University of Helsinki , PO Box 43, FI-00014, FinlandDepartment of Physics, University of Helsinki , PO Box 43, FI-00014, FinlandDepartment of Physics, University of Helsinki , PO Box 43, FI-00014, FinlandInstitute of Solid State Physics, University of Jena , Max-Wien-Platz 1, D-07743 Jena, GermanyIon beam processing of surfaces is well known to lead to sputtering, which conventionally is associated only with erosion of atoms from the material. We show here, by combination of experiments and a newly developed Monte Carlo algorithm, that in the case of nanoparticles in a regular two-dimensional array on surfaces, the redeposition of sputtered atoms may play a significant role on the system development. The simulations are directly compared to in situ experiments obtained using a dual focused Ga ^+ ion beam system and high resolution scanning electron microscopy, and explain the size evolution by a combination of sputtering and redeposition of sputtered material on neighboring particles. The effect is found to be dependent on the size of the nanoparticles: if the nanoparticle size is comparable to the ion range, the reposition is negligible. For larger nanoparticles the redeposition becomes significant and is able to compensate up to 20% of the sputtered material, effectively reducing the process of sputtering. The redeposition may even lead to significant growth: this was seen for the nanoparticles with the sizes much smaller than the ion range. Furthermore, the algorithm shows that significant redeposition is possible when the large size neighboring nanoparticles are present.https://doi.org/10.1088/1367-2630/aa56ebsputteringredepositionion beam modificationnanoparticles |
| spellingShingle | Henry Holland-Moritz Andrey Ilinov Flyura Djurabekova Kai Nordlund Carsten Ronning Sputtering and redeposition of ion irradiated Au nanoparticle arrays: direct comparison of simulations to experiments New Journal of Physics sputtering redeposition ion beam modification nanoparticles |
| title | Sputtering and redeposition of ion irradiated Au nanoparticle arrays: direct comparison of simulations to experiments |
| title_full | Sputtering and redeposition of ion irradiated Au nanoparticle arrays: direct comparison of simulations to experiments |
| title_fullStr | Sputtering and redeposition of ion irradiated Au nanoparticle arrays: direct comparison of simulations to experiments |
| title_full_unstemmed | Sputtering and redeposition of ion irradiated Au nanoparticle arrays: direct comparison of simulations to experiments |
| title_short | Sputtering and redeposition of ion irradiated Au nanoparticle arrays: direct comparison of simulations to experiments |
| title_sort | sputtering and redeposition of ion irradiated au nanoparticle arrays direct comparison of simulations to experiments |
| topic | sputtering redeposition ion beam modification nanoparticles |
| url | https://doi.org/10.1088/1367-2630/aa56eb |
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