Formation Mechanism of Precursor Films at High Temperatures: A Review
Abstract The formation of a precursor film (PF) is always coupled with better wettability; thus, clarifying the formation mechanism is required to optimize the interfacial structures. However, recent research focuses on inert wetting systems at room temperature, which cannot guide practical material...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
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SpringerOpen
2022-03-01
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| Series: | Chinese Journal of Mechanical Engineering |
| Subjects: | |
| Online Access: | https://doi.org/10.1186/s10033-022-00686-4 |
| _version_ | 1818919691829116928 |
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| author | Qiaoli Lin Lu Liu Wenqi Zhu |
| author_facet | Qiaoli Lin Lu Liu Wenqi Zhu |
| author_sort | Qiaoli Lin |
| collection | DOAJ |
| description | Abstract The formation of a precursor film (PF) is always coupled with better wettability; thus, clarifying the formation mechanism is required to optimize the interfacial structures. However, recent research focuses on inert wetting systems at room temperature, which cannot guide practical material processing at high temperatures. In this review, PF formation mechanisms at high temperatures were reviewed. The mechanisms are surface diffusion, evaporation–condensation, subcutaneous infiltration, and rapid absorption and film overflow. In experimental metal/metal systems, the most probable mechanism is subcutaneous infiltration, related to the apparent contact angle, radius, and height of the gap between the substrate metal and the oxide film. The rapid absorption and film overflow mechanism usually occurs in metal/ceramic systems. The PF appearance for the adsorption mechanism must satisfy the paradox, that is, the relative inertial and high-affinity liquid/solid interface. Finally, another possible mechanism of PF appearance for the reactive wetting system at high temperatures was proposed, that is, the thin-surface transport mechanism. The PF formation is sensitive to external conditions. Therefore, it is necessary to develop thermodynamic and dynamic models for predicting and simulating PFs. |
| first_indexed | 2024-12-20T01:09:53Z |
| format | Article |
| id | doaj.art-fd3bff0233184c8a907ec220883486c0 |
| institution | Directory Open Access Journal |
| issn | 1000-9345 2192-8258 |
| language | English |
| last_indexed | 2024-12-20T01:09:53Z |
| publishDate | 2022-03-01 |
| publisher | SpringerOpen |
| record_format | Article |
| series | Chinese Journal of Mechanical Engineering |
| spelling | doaj.art-fd3bff0233184c8a907ec220883486c02022-12-21T19:58:43ZengSpringerOpenChinese Journal of Mechanical Engineering1000-93452192-82582022-03-0135111110.1186/s10033-022-00686-4Formation Mechanism of Precursor Films at High Temperatures: A ReviewQiaoli Lin0Lu Liu1Wenqi Zhu2State Key Laboratory of Advanced Processing and Recycling of Non-ferrous Metal, Lanzhou University of TechnologyState Key Laboratory of Advanced Processing and Recycling of Non-ferrous Metal, Lanzhou University of TechnologyState Key Laboratory of Advanced Processing and Recycling of Non-ferrous Metal, Lanzhou University of TechnologyAbstract The formation of a precursor film (PF) is always coupled with better wettability; thus, clarifying the formation mechanism is required to optimize the interfacial structures. However, recent research focuses on inert wetting systems at room temperature, which cannot guide practical material processing at high temperatures. In this review, PF formation mechanisms at high temperatures were reviewed. The mechanisms are surface diffusion, evaporation–condensation, subcutaneous infiltration, and rapid absorption and film overflow. In experimental metal/metal systems, the most probable mechanism is subcutaneous infiltration, related to the apparent contact angle, radius, and height of the gap between the substrate metal and the oxide film. The rapid absorption and film overflow mechanism usually occurs in metal/ceramic systems. The PF appearance for the adsorption mechanism must satisfy the paradox, that is, the relative inertial and high-affinity liquid/solid interface. Finally, another possible mechanism of PF appearance for the reactive wetting system at high temperatures was proposed, that is, the thin-surface transport mechanism. The PF formation is sensitive to external conditions. Therefore, it is necessary to develop thermodynamic and dynamic models for predicting and simulating PFs.https://doi.org/10.1186/s10033-022-00686-4WettabilityWetting footHaloDiffusing band |
| spellingShingle | Qiaoli Lin Lu Liu Wenqi Zhu Formation Mechanism of Precursor Films at High Temperatures: A Review Chinese Journal of Mechanical Engineering Wettability Wetting foot Halo Diffusing band |
| title | Formation Mechanism of Precursor Films at High Temperatures: A Review |
| title_full | Formation Mechanism of Precursor Films at High Temperatures: A Review |
| title_fullStr | Formation Mechanism of Precursor Films at High Temperatures: A Review |
| title_full_unstemmed | Formation Mechanism of Precursor Films at High Temperatures: A Review |
| title_short | Formation Mechanism of Precursor Films at High Temperatures: A Review |
| title_sort | formation mechanism of precursor films at high temperatures a review |
| topic | Wettability Wetting foot Halo Diffusing band |
| url | https://doi.org/10.1186/s10033-022-00686-4 |
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