Formation Mechanism of Precursor Films at High Temperatures: A Review

Formation Mechanism of Precursor Films at High Temperatures: A Review

Abstract The formation of a precursor film (PF) is always coupled with better wettability; thus, clarifying the formation mechanism is required to optimize the interfacial structures. However, recent research focuses on inert wetting systems at room temperature, which cannot guide practical material...

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Bibliographic Details
Main Authors: Qiaoli Lin, Lu Liu, Wenqi Zhu
Format: Article
Language:English
Published: SpringerOpen 2022-03-01
Series:Chinese Journal of Mechanical Engineering
Subjects:
Wettability
Wetting foot
Halo
Diffusing band
Online Access:https://doi.org/10.1186/s10033-022-00686-4

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