Multiscale Simulations for Defect-Controlled Processing of Group IV Materials

Multiscale approaches for the simulation of materials processing are becoming essential to the industrialization of future nanotechnologies, as they allow for a reduction in production costs and an enhancement of devices and applications. Their integration as modules of “digital twins”, i.e., a comb...

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Detalhes bibliográficos
Principais autores: Gaetano Calogero, Ioannis Deretzis, Giuseppe Fisicaro, Manuel Kollmuß, Francesco La Via, Salvatore F. Lombardo, Michael Schöler, Peter J. Wellmann, Antonino La Magna
Formato: Artigo
Idioma:English
Publicado em: MDPI AG 2022-11-01
coleção:Crystals
Assuntos:
Acesso em linha:https://www.mdpi.com/2073-4352/12/12/1701