Photopatterning of PDMS Films: Challenging the Reaction between Benzophenone and Silicone Functional Groups

Direct photopatterning of PDMS (Polydimethylsiloxane) through benzophenone photo-inhibition has received great interest in recent years. Indeed, the simplicity and versatility of this technique allows for easy processing of micro-canals, or local control of PDMS mechanical properties. Surprisingly,...

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Bibliographic Details
Main Authors: Arthur Stricher, Renaud G. Rinaldi, Laurent Chazeau, François Ganachaud
Format: Article
Language:English
Published: MDPI AG 2021-04-01
Series:Materials
Subjects:
Online Access:https://www.mdpi.com/1996-1944/14/8/2027

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