Photopatterning of PDMS Films: Challenging the Reaction between Benzophenone and Silicone Functional Groups
Direct photopatterning of PDMS (Polydimethylsiloxane) through benzophenone photo-inhibition has received great interest in recent years. Indeed, the simplicity and versatility of this technique allows for easy processing of micro-canals, or local control of PDMS mechanical properties. Surprisingly,...
Main Authors: | Arthur Stricher, Renaud G. Rinaldi, Laurent Chazeau, François Ganachaud |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2021-04-01
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Series: | Materials |
Subjects: | |
Online Access: | https://www.mdpi.com/1996-1944/14/8/2027 |
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