Xenon difluoride etching and molecular oxygen oxidation of silicon by reactive scattering

Xenon difluoride etching and molecular oxygen oxidation of silicon by reactive scattering

Thesis: S.M., Massachusetts Institute of Technology, Department of Chemistry, 2015.

Bibliographic Details
Main Author:	Rowlands, Daniel Walter
Other Authors:	Massachusetts Institute of Technology. Department of Chemistry.
Format:	Thesis
Language:	eng
Published:	Massachusetts Institute of Technology 2016
Subjects:	Chemistry.
Online Access:	http://hdl.handle.net/1721.1/101559

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