Simulation methods for solvent vapor annealing of block copolymer thin films
Recent progress in modelling the solvent vapor annealing of thin film block copolymers is examined in the context of a self-consistent field theory framework. Key control variables in determining the final microdomain morphologies include swelling ratio or swollen film solvent volume fraction, swoll...
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| Format: | Article |
| Language: | en_US |
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Royal Society of Chemistry
2016
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| Online Access: | http://hdl.handle.net/1721.1/101738 https://orcid.org/0000-0002-8554-6998 https://orcid.org/0000-0003-2262-1249 https://orcid.org/0000-0001-5554-1283 |
| _version_ | 1826213679854518272 |
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| author | Hannon, Adam F. Bai, Wubin Alexander-Katz, Alfredo Ross, Caroline A. |
| author2 | Massachusetts Institute of Technology. Department of Materials Science and Engineering |
| author_facet | Massachusetts Institute of Technology. Department of Materials Science and Engineering Hannon, Adam F. Bai, Wubin Alexander-Katz, Alfredo Ross, Caroline A. |
| author_sort | Hannon, Adam F. |
| collection | MIT |
| description | Recent progress in modelling the solvent vapor annealing of thin film block copolymers is examined in the context of a self-consistent field theory framework. Key control variables in determining the final microdomain morphologies include swelling ratio or swollen film solvent volume fraction, swollen film thickness, substrate and vapor atmosphere surface energies, effective volume fraction, and effective Flory–Huggins interaction parameter. The regime of solvent vapor annealing studied is where the block copolymer has a high enough Flory–Huggins parameter that ordered structures form during swelling and are then trapped in the system through quenching. Both implicit and explicit consideration of the solvent vapor is considered to distinguish the cases in which solvent vapor leads to a non-bulk morphology. Block-selective solvents are considered based on the experimental systems of polystyrene-b-polydimethylsiloxane annealed with toluene and heptane. The results of these simulations are compared with these experiments. |
| first_indexed | 2024-09-23T15:53:06Z |
| format | Article |
| id | mit-1721.1/101738 |
| institution | Massachusetts Institute of Technology |
| language | en_US |
| last_indexed | 2024-09-23T15:53:06Z |
| publishDate | 2016 |
| publisher | Royal Society of Chemistry |
| record_format | dspace |
| spelling | mit-1721.1/1017382022-09-29T16:49:25Z Simulation methods for solvent vapor annealing of block copolymer thin films Hannon, Adam F. Bai, Wubin Alexander-Katz, Alfredo Ross, Caroline A. Massachusetts Institute of Technology. Department of Materials Science and Engineering Hannon, Adam F. Bai, Wubin Alexander-Katz, Alfredo Ross, Caroline A. Recent progress in modelling the solvent vapor annealing of thin film block copolymers is examined in the context of a self-consistent field theory framework. Key control variables in determining the final microdomain morphologies include swelling ratio or swollen film solvent volume fraction, swollen film thickness, substrate and vapor atmosphere surface energies, effective volume fraction, and effective Flory–Huggins interaction parameter. The regime of solvent vapor annealing studied is where the block copolymer has a high enough Flory–Huggins parameter that ordered structures form during swelling and are then trapped in the system through quenching. Both implicit and explicit consideration of the solvent vapor is considered to distinguish the cases in which solvent vapor leads to a non-bulk morphology. Block-selective solvents are considered based on the experimental systems of polystyrene-b-polydimethylsiloxane annealed with toluene and heptane. The results of these simulations are compared with these experiments. National Science Foundation (U.S.) (Award CMMI 1246740) Taiwan Semiconductor Manufacturing Company Tokyo Electron Limited Semiconductor Research Corporation 2016-03-18T14:38:15Z 2016-03-18T14:38:15Z 2015-03 2015-02 Article http://purl.org/eprint/type/JournalArticle 1744-683X 1744-6848 http://hdl.handle.net/1721.1/101738 Hannon, A. F., W. Bai, A. Alexander-Katz, and C. A. Ross. “Simulation Methods for Solvent Vapor Annealing of Block Copolymer Thin Films.” Soft Matter 11, no. 19 (2015): 3794–3805. © 2015 The Royal Society of Chemistry https://orcid.org/0000-0002-8554-6998 https://orcid.org/0000-0003-2262-1249 https://orcid.org/0000-0001-5554-1283 en_US http://dx.doi.org/10.1039/c5sm00324e Soft Matter Creative Commons Attribution 3.0 Unported licence http://creativecommons.org/licenses/by/3.0/ application/pdf Royal Society of Chemistry Royal Society of Chemistry |
| spellingShingle | Hannon, Adam F. Bai, Wubin Alexander-Katz, Alfredo Ross, Caroline A. Simulation methods for solvent vapor annealing of block copolymer thin films |
| title | Simulation methods for solvent vapor annealing of block copolymer thin films |
| title_full | Simulation methods for solvent vapor annealing of block copolymer thin films |
| title_fullStr | Simulation methods for solvent vapor annealing of block copolymer thin films |
| title_full_unstemmed | Simulation methods for solvent vapor annealing of block copolymer thin films |
| title_short | Simulation methods for solvent vapor annealing of block copolymer thin films |
| title_sort | simulation methods for solvent vapor annealing of block copolymer thin films |
| url | http://hdl.handle.net/1721.1/101738 https://orcid.org/0000-0002-8554-6998 https://orcid.org/0000-0003-2262-1249 https://orcid.org/0000-0001-5554-1283 |
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