Chemically assisted femtosecond laser machining for applications in LiNbO[subscript 3] and LiTaO[subscript 3]
We introduce and optimize a fabrication procedure that employs both femtosecond laser machining and hydrofluoric acid etching for cutting holes or voids in slabs of lithium niobate and lithium tantalate. The fabricated structures have 3 μm lateral resolution, a lateral extent of at least several mil...
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| Format: | Article |
| Language: | English |
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Springer Berlin Heidelberg
2016
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| Online Access: | http://hdl.handle.net/1721.1/103600 https://orcid.org/0000-0002-0737-6786 https://orcid.org/0000-0001-7804-5418 https://orcid.org/0000-0002-1603-4067 |
| _version_ | 1826194586489323520 |
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| author | Sivarajah, Prasahnt Werley, Christopher Alan Ofori-Okai, Benjamin Kwasi Nelson, Keith Adam |
| author2 | Massachusetts Institute of Technology. Department of Chemistry |
| author_facet | Massachusetts Institute of Technology. Department of Chemistry Sivarajah, Prasahnt Werley, Christopher Alan Ofori-Okai, Benjamin Kwasi Nelson, Keith Adam |
| author_sort | Sivarajah, Prasahnt |
| collection | MIT |
| description | We introduce and optimize a fabrication procedure that employs both femtosecond laser machining and hydrofluoric acid etching for cutting holes or voids in slabs of lithium niobate and lithium tantalate. The fabricated structures have 3 μm lateral resolution, a lateral extent of at least several millimeters, and cut depths of up to 100 μm. Excellent surface quality is achieved by initially protecting the optical surface with a sacrificial silicon dioxide layer that is later removed during chemical etching. To optimize cut quality and machining speed, we explored various laser-machining parameters, including laser polarization, repetition rate, pulse duration, pulse energy, exposure time, and focusing, as well as scanning, protective coating, and etching procedures. The resulting structures significantly broaden the capabilities of terahertz polaritonics, in which lithium niobate and lithium tantalate are used for terahertz wave generation, imaging, and control. The approach should be applicable to a wide range of materials that are difficult to process by conventional methods. |
| first_indexed | 2024-09-23T09:58:33Z |
| format | Article |
| id | mit-1721.1/103600 |
| institution | Massachusetts Institute of Technology |
| language | English |
| last_indexed | 2024-09-23T09:58:33Z |
| publishDate | 2016 |
| publisher | Springer Berlin Heidelberg |
| record_format | dspace |
| spelling | mit-1721.1/1036002022-09-26T14:57:15Z Chemically assisted femtosecond laser machining for applications in LiNbO[subscript 3] and LiTaO[subscript 3] Chemically assisted femtosecond laser machining for applications in LiNbO3 and LiTaO3 Sivarajah, Prasahnt Werley, Christopher Alan Ofori-Okai, Benjamin Kwasi Nelson, Keith Adam Massachusetts Institute of Technology. Department of Chemistry Sivarajah, Prasahnt Werley, Christopher Alan Ofori-Okai, Benjamin Kwasi Nelson, Keith Adam We introduce and optimize a fabrication procedure that employs both femtosecond laser machining and hydrofluoric acid etching for cutting holes or voids in slabs of lithium niobate and lithium tantalate. The fabricated structures have 3 μm lateral resolution, a lateral extent of at least several millimeters, and cut depths of up to 100 μm. Excellent surface quality is achieved by initially protecting the optical surface with a sacrificial silicon dioxide layer that is later removed during chemical etching. To optimize cut quality and machining speed, we explored various laser-machining parameters, including laser polarization, repetition rate, pulse duration, pulse energy, exposure time, and focusing, as well as scanning, protective coating, and etching procedures. The resulting structures significantly broaden the capabilities of terahertz polaritonics, in which lithium niobate and lithium tantalate are used for terahertz wave generation, imaging, and control. The approach should be applicable to a wide range of materials that are difficult to process by conventional methods. National Science Foundation (U.S.) (grant no. ECCS-1128632) National Institutes of Health (U.S.) (NSF GRFP fellowship) National Research Council Canada (Canadian Research Fellowship) 2016-07-14T14:43:41Z 2016-07-14T14:43:41Z 2013-07 2013-06 2016-05-23T12:09:51Z Article http://purl.org/eprint/type/JournalArticle 0947-8396 1432-0630 http://hdl.handle.net/1721.1/103600 Sivarajah, Prasahnt, Christopher A. Werley, Benjamin K. Ofori-Okai, and Keith A. Nelson. “Chemically Assisted Femtosecond Laser Machining for Applications in LiNbO3 and LiTaO3.” Applied Physics A 112, no. 3 (July 6, 2013): 615–622. https://orcid.org/0000-0002-0737-6786 https://orcid.org/0000-0001-7804-5418 https://orcid.org/0000-0002-1603-4067 en http://dx.doi.org/10.1007/s00339-013-7833-x Applied Physics A Creative Commons Attribution-Noncommercial-Share Alike http://creativecommons.org/licenses/by-nc-sa/4.0/ Springer-Verlag Berlin Heidelberg application/pdf Springer Berlin Heidelberg Springer Berlin Heidelberg |
| spellingShingle | Sivarajah, Prasahnt Werley, Christopher Alan Ofori-Okai, Benjamin Kwasi Nelson, Keith Adam Chemically assisted femtosecond laser machining for applications in LiNbO[subscript 3] and LiTaO[subscript 3] |
| title | Chemically assisted femtosecond laser machining for applications in LiNbO[subscript 3] and LiTaO[subscript 3] |
| title_full | Chemically assisted femtosecond laser machining for applications in LiNbO[subscript 3] and LiTaO[subscript 3] |
| title_fullStr | Chemically assisted femtosecond laser machining for applications in LiNbO[subscript 3] and LiTaO[subscript 3] |
| title_full_unstemmed | Chemically assisted femtosecond laser machining for applications in LiNbO[subscript 3] and LiTaO[subscript 3] |
| title_short | Chemically assisted femtosecond laser machining for applications in LiNbO[subscript 3] and LiTaO[subscript 3] |
| title_sort | chemically assisted femtosecond laser machining for applications in linbo subscript 3 and litao subscript 3 |
| url | http://hdl.handle.net/1721.1/103600 https://orcid.org/0000-0002-0737-6786 https://orcid.org/0000-0001-7804-5418 https://orcid.org/0000-0002-1603-4067 |
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