Parallel Stitching of Two-Dimensional Materials
Diverse parallel stitched 2D heterostructures, including metal–semiconductor, semiconductor–semiconductor, and insulator–semiconductor, are synthesized directly through selective “sowing” of aromatic molecules as the seeds in the chemical vapor deposition (CVD) method. The methodology enables the la...
| Main Authors: | , , , , , , , , , , , , , , , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
John Wiley & Sons
2016
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| Online Access: | http://hdl.handle.net/1721.1/104870 https://orcid.org/0000-0002-1955-3081 https://orcid.org/0000-0003-0638-2620 https://orcid.org/0000-0002-5103-6973 https://orcid.org/0000-0002-2354-302X https://orcid.org/0000-0002-5603-7991 https://orcid.org/0000-0001-5777-8364 https://orcid.org/0000-0002-3618-9074 https://orcid.org/0000-0002-3416-3962 https://orcid.org/0000-0001-7409-2444 https://orcid.org/0000-0002-7841-8058 https://orcid.org/0000-0001-8217-8213 https://orcid.org/0000-0001-8492-2261 https://orcid.org/0000-0002-2190-563X https://orcid.org/0000-0003-0551-1208 |
| Summary: | Diverse parallel stitched 2D heterostructures, including metal–semiconductor, semiconductor–semiconductor, and insulator–semiconductor, are synthesized directly through selective “sowing” of aromatic molecules as the seeds in the chemical vapor deposition (CVD) method. The methodology enables the large-scale fabrication of lateral heterostructures, which offers tremendous potential for its application in integrated circuits. |
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