High-Throughput Fabrication of Resonant Metamaterials with Ultrasmall Coaxial Apertures via Atomic Layer Lithography
We combine atomic layer lithography and glancing-angle ion polishing to create wafer-scale metamaterials composed of dense arrays of ultrasmall coaxial nanocavities in gold films. This new fabrication scheme makes it possible to shrink the diameter and increase the packing density of 2 nm-gap coaxia...
| Main Authors: | , , , , , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
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American Chemical Society (ACS)
2016
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| Online Access: | http://hdl.handle.net/1721.1/105728 https://orcid.org/0000-0002-8556-685X |
| _version_ | 1826188819707199488 |
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| author | Yoo, Daehan Martin-Moreno, Luis Mohr, Daniel A. Carretero-Palacios, Sol Shaver, Jonah Ebbesen, Thomas W. Oh, Sang-Hyun Nguyen, Ngoc Cuong Peraire, Jaime |
| author2 | Massachusetts Institute of Technology. Department of Aeronautics and Astronautics |
| author_facet | Massachusetts Institute of Technology. Department of Aeronautics and Astronautics Yoo, Daehan Martin-Moreno, Luis Mohr, Daniel A. Carretero-Palacios, Sol Shaver, Jonah Ebbesen, Thomas W. Oh, Sang-Hyun Nguyen, Ngoc Cuong Peraire, Jaime |
| author_sort | Yoo, Daehan |
| collection | MIT |
| description | We combine atomic layer lithography and glancing-angle ion polishing to create wafer-scale metamaterials composed of dense arrays of ultrasmall coaxial nanocavities in gold films. This new fabrication scheme makes it possible to shrink the diameter and increase the packing density of 2 nm-gap coaxial resonators, an extreme subwavelength structure first manufactured via atomic layer lithography, both by a factor of 100 with respect to previous studies. We demonstrate that the nonpropagating zeroth-order Fabry-Pérot mode, which possesses slow light-like properties at the cutoff resonance, traps infrared light inside 2 nm gaps (gap volume ∼ λ[superscript]3/10[superscript 6]). Notably, the annular gaps cover only 3% or less of the metal surface, while open-area normalized transmission is as high as 1700% at the epsilon-near-zero (ENZ) condition. The resulting energy accumulation alongside extraordinary optical transmission can benefit applications in nonlinear optics, optical trapping, and surface-enhanced spectroscopies. Furthermore, because the resonance wavelength is independent of the cavity length and dramatically red shifts as the gap size is reduced, large-area arrays can be constructed with λresonance ≫ period, making this fabrication method ideal for manufacturing resonant metamaterials. |
| first_indexed | 2024-09-23T08:05:12Z |
| format | Article |
| id | mit-1721.1/105728 |
| institution | Massachusetts Institute of Technology |
| language | en_US |
| last_indexed | 2024-09-23T08:05:12Z |
| publishDate | 2016 |
| publisher | American Chemical Society (ACS) |
| record_format | dspace |
| spelling | mit-1721.1/1057282022-09-23T10:50:37Z High-Throughput Fabrication of Resonant Metamaterials with Ultrasmall Coaxial Apertures via Atomic Layer Lithography Yoo, Daehan Martin-Moreno, Luis Mohr, Daniel A. Carretero-Palacios, Sol Shaver, Jonah Ebbesen, Thomas W. Oh, Sang-Hyun Nguyen, Ngoc Cuong Peraire, Jaime Massachusetts Institute of Technology. Department of Aeronautics and Astronautics Nguyen, Ngoc Cuong Peraire, Jaime We combine atomic layer lithography and glancing-angle ion polishing to create wafer-scale metamaterials composed of dense arrays of ultrasmall coaxial nanocavities in gold films. This new fabrication scheme makes it possible to shrink the diameter and increase the packing density of 2 nm-gap coaxial resonators, an extreme subwavelength structure first manufactured via atomic layer lithography, both by a factor of 100 with respect to previous studies. We demonstrate that the nonpropagating zeroth-order Fabry-Pérot mode, which possesses slow light-like properties at the cutoff resonance, traps infrared light inside 2 nm gaps (gap volume ∼ λ[superscript]3/10[superscript 6]). Notably, the annular gaps cover only 3% or less of the metal surface, while open-area normalized transmission is as high as 1700% at the epsilon-near-zero (ENZ) condition. The resulting energy accumulation alongside extraordinary optical transmission can benefit applications in nonlinear optics, optical trapping, and surface-enhanced spectroscopies. Furthermore, because the resonance wavelength is independent of the cavity length and dramatically red shifts as the gap size is reduced, large-area arrays can be constructed with λresonance ≫ period, making this fabrication method ideal for manufacturing resonant metamaterials. United States. Air Force Office of Scientific Research (Grants FA9550-12-1-0357 and FA9550-11-1-0141) 2016-12-06T19:46:31Z 2016-12-06T19:46:31Z 2016-02 2016-02 Article http://purl.org/eprint/type/JournalArticle 1530-6984 1530-6992 http://hdl.handle.net/1721.1/105728 Yoo, Daehan et al. “High-Throughput Fabrication of Resonant Metamaterials with Ultrasmall Coaxial Apertures via Atomic Layer Lithography.” Nano Letters 16.3 (2016): 2040–2046. © 2016 American Chemical Society https://orcid.org/0000-0002-8556-685X en_US http://dx.doi.org/10.1021/acs.nanolett.6b00024 Nano Letters Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf American Chemical Society (ACS) ACS |
| spellingShingle | Yoo, Daehan Martin-Moreno, Luis Mohr, Daniel A. Carretero-Palacios, Sol Shaver, Jonah Ebbesen, Thomas W. Oh, Sang-Hyun Nguyen, Ngoc Cuong Peraire, Jaime High-Throughput Fabrication of Resonant Metamaterials with Ultrasmall Coaxial Apertures via Atomic Layer Lithography |
| title | High-Throughput Fabrication of Resonant Metamaterials with Ultrasmall Coaxial Apertures via Atomic Layer Lithography |
| title_full | High-Throughput Fabrication of Resonant Metamaterials with Ultrasmall Coaxial Apertures via Atomic Layer Lithography |
| title_fullStr | High-Throughput Fabrication of Resonant Metamaterials with Ultrasmall Coaxial Apertures via Atomic Layer Lithography |
| title_full_unstemmed | High-Throughput Fabrication of Resonant Metamaterials with Ultrasmall Coaxial Apertures via Atomic Layer Lithography |
| title_short | High-Throughput Fabrication of Resonant Metamaterials with Ultrasmall Coaxial Apertures via Atomic Layer Lithography |
| title_sort | high throughput fabrication of resonant metamaterials with ultrasmall coaxial apertures via atomic layer lithography |
| url | http://hdl.handle.net/1721.1/105728 https://orcid.org/0000-0002-8556-685X |
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