High-Throughput Fabrication of Resonant Metamaterials with Ultrasmall Coaxial Apertures via Atomic Layer Lithography

High-Throughput Fabrication of Resonant Metamaterials with Ultrasmall Coaxial Apertures via Atomic Layer Lithography

We combine atomic layer lithography and glancing-angle ion polishing to create wafer-scale metamaterials composed of dense arrays of ultrasmall coaxial nanocavities in gold films. This new fabrication scheme makes it possible to shrink the diameter and increase the packing density of 2 nm-gap coaxia...

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Bibliographic Details
Main Authors: Yoo, Daehan, Martin-Moreno, Luis, Mohr, Daniel A., Carretero-Palacios, Sol, Shaver, Jonah, Ebbesen, Thomas W., Oh, Sang-Hyun, Nguyen, Ngoc Cuong, Peraire, Jaime
Other Authors: Massachusetts Institute of Technology. Department of Aeronautics and Astronautics
Format: Article
Language:en_US
Published: American Chemical Society (ACS) 2016
Online Access:http://hdl.handle.net/1721.1/105728
https://orcid.org/0000-0002-8556-685X

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