Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation

The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOC...

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Main Authors: Perrotta, Alberto, Heinze, Katja, Creatore, Mariadriana, Boscher, Nicolas, Wang, Minghui, Gleason, Karen K
Other Authors: Massachusetts Institute of Technology. Department of Chemical Engineering
Format: Article
Language:en_US
Published: Wiley Blackwell 2017
Online Access:http://hdl.handle.net/1721.1/108287
https://orcid.org/0000-0003-2609-4204
https://orcid.org/0000-0001-6127-1056
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author Perrotta, Alberto
Heinze, Katja
Creatore, Mariadriana
Boscher, Nicolas
Wang, Minghui
Gleason, Karen K
author2 Massachusetts Institute of Technology. Department of Chemical Engineering
author_facet Massachusetts Institute of Technology. Department of Chemical Engineering
Perrotta, Alberto
Heinze, Katja
Creatore, Mariadriana
Boscher, Nicolas
Wang, Minghui
Gleason, Karen K
author_sort Perrotta, Alberto
collection MIT
description The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.
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spelling mit-1721.1/1082872022-09-30T07:59:29Z Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation Perrotta, Alberto Heinze, Katja Creatore, Mariadriana Boscher, Nicolas Wang, Minghui Gleason, Karen K Massachusetts Institute of Technology. Department of Chemical Engineering Gleason, Karen K. Boscher, Nicolas Wang, Minghui Gleason, Karen K The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs. United States. Army Research Office. Institute for Soldier Nanotechnologies (Contract DAAD-19-02D-0002) Luxembourg National Research Fund 2017-04-20T15:14:55Z 2017-04-20T15:14:55Z 2016-09 2016-05 Article http://purl.org/eprint/type/JournalArticle 0935-9648 1521-4095 http://hdl.handle.net/1721.1/108287 Boscher, Nicolas D. et al. “Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation.” Advanced Materials 28.34 (2016): 7479–7485. https://orcid.org/0000-0003-2609-4204 https://orcid.org/0000-0001-6127-1056 en_US http://dx.doi.org/10.1002/adma.201601010 Advanced Materials Creative Commons Attribution-Noncommercial-Share Alike http://creativecommons.org/licenses/by-nc-sa/4.0/ application/pdf Wiley Blackwell Prof. Gleason
spellingShingle Perrotta, Alberto
Heinze, Katja
Creatore, Mariadriana
Boscher, Nicolas
Wang, Minghui
Gleason, Karen K
Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation
title Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation
title_full Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation
title_fullStr Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation
title_full_unstemmed Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation
title_short Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation
title_sort metal organic covalent network chemical vapor deposition for gas separation
url http://hdl.handle.net/1721.1/108287
https://orcid.org/0000-0003-2609-4204
https://orcid.org/0000-0001-6127-1056
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