Design Optimization of Single-Layer Antireflective Coating for GaAs[subscript 1−x]xP[subscript x]x/Si Tandem Cells With x=0, 0.17, 0.29, and 0.37
Single-layer antireflective coating (SLARC) materials and design for GaAs1_xPx/Si tandem cells were analyzed by TCAD simulation. We have shown that optimum SLARC thickness is a function of bandgap, thickness, and material quality of top GaAs1-xPx/Sisubcell. Cells are analyzed for P fractions x = 0,...
| Main Authors: | , , , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
Institute of Electrical and Electronics Engineers (IEEE)
2017
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| Online Access: | http://hdl.handle.net/1721.1/108586 https://orcid.org/0000-0002-1891-1959 |
| Summary: | Single-layer antireflective coating (SLARC) materials and design for GaAs1_xPx/Si tandem cells were analyzed by TCAD simulation. We have shown that optimum SLARC thickness is a function of bandgap, thickness, and material quality of top GaAs1-xPx/Sisubcell. Cells are analyzed for P fractions x = 0, 0.17, 0.29, and 0.37, and ARC materials: Si3N4, SiO2 , ITO, 11fO2, and Al2O3. Optimum ARC thickness ranges from 65-75 nm for Si3N4 and ITO to ~100-110 nm for SiO2. Optimum ARC thickness increases with increasing GaAs1_xPx absorber layer thickness and with decreasing P fraction x. Simulations show that optimum GaAs1-xPx/Siabsorber layer thickness is not a strong function of ARC material, but it increases from 250 nm for x = 0 to1 μm for x = 0.29 and 0.37. For all P fractions, Si3N4, 11fO2, and Al2O3 performed almost equally, while SiO2 and ITO resulted in ~1% and ~2% lower efficiency, respectively. Optimum SLARC thickness increases as the material quality of the top cell increases. The effect of ARC material decreases with decreasing GaAs1_xPx material quality. The maximum efficiencies are achieved for cells with ~1-μm GaAs0.71P0.29 absorber (r = 10 ns): ~26.57% for 75-nm Si3N4 SLARC and 27.62% for 75-nm SiO2/60-nm Si3N4 double-layer ARC. |
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