Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics
Plasmonics enables deep-subwavelength concentration of light and has become important for fundamental studies as well as real-life applications. Two major existing platforms of plasmonics are metallic nanoparticles and metallic films. Metallic nanoparticles allow efficient coupling to far field radi...
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| Format: | Article |
| Language: | en_US |
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American Chemical Society (ACS)
2017
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| Online Access: | http://hdl.handle.net/1721.1/109886 https://orcid.org/0000-0003-2879-4968 https://orcid.org/0000-0002-7572-4594 https://orcid.org/0000-0002-7184-5831 https://orcid.org/0000-0003-2745-2392 https://orcid.org/0000-0002-7244-3682 |
| _version_ | 1826190153275670528 |
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| author | Hsu, Chia Wei Miller, Owen D. Yang, Yi Zhen, Bo Soljacic, Marin Joannopoulos, John |
| author2 | Massachusetts Institute of Technology. Department of Mathematics |
| author_facet | Massachusetts Institute of Technology. Department of Mathematics Hsu, Chia Wei Miller, Owen D. Yang, Yi Zhen, Bo Soljacic, Marin Joannopoulos, John |
| author_sort | Hsu, Chia Wei |
| collection | MIT |
| description | Plasmonics enables deep-subwavelength concentration of light and has become important for fundamental studies as well as real-life applications. Two major existing platforms of plasmonics are metallic nanoparticles and metallic films. Metallic nanoparticles allow efficient coupling to far field radiation, yet their synthesis typically leads to poor material quality. Metallic films offer substantially higher quality materials, but their coupling to radiation is typically jeopardized due to the large momentum mismatch with free space. Here, we propose and theoretically investigate optically thin metallic films as an ideal platform for high-radiative-efficiency plasmonics. For far-field scattering, adding a thin high-quality metallic substrate enables a higher quality factor while maintaining the localization and tunability that the nanoparticle provides. For near-field spontaneous emission, a thin metallic substrate, of high quality or not, greatly improves the field overlap between the emitter environment and propagating surface plasmons, enabling high-Purcell (total enhancement >10[superscript 4]), high-quantum-yield (>50%) spontaneous emission, even as the gap size vanishes (3–5 nm). The enhancement has almost spatially independent efficiency and does not suffer from quenching effects that commonly exist in previous structures. |
| first_indexed | 2024-09-23T08:35:54Z |
| format | Article |
| id | mit-1721.1/109886 |
| institution | Massachusetts Institute of Technology |
| language | en_US |
| last_indexed | 2024-09-23T08:35:54Z |
| publishDate | 2017 |
| publisher | American Chemical Society (ACS) |
| record_format | dspace |
| spelling | mit-1721.1/1098862022-09-23T13:10:28Z Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics Hsu, Chia Wei Miller, Owen D. Yang, Yi Zhen, Bo Soljacic, Marin Joannopoulos, John Massachusetts Institute of Technology. Department of Mathematics Massachusetts Institute of Technology. Department of Physics Massachusetts Institute of Technology. Research Laboratory of Electronics Yang, Yi Zhen, Bo Soljacic, Marin Miller, Owen D. Joannopoulos, John Plasmonics enables deep-subwavelength concentration of light and has become important for fundamental studies as well as real-life applications. Two major existing platforms of plasmonics are metallic nanoparticles and metallic films. Metallic nanoparticles allow efficient coupling to far field radiation, yet their synthesis typically leads to poor material quality. Metallic films offer substantially higher quality materials, but their coupling to radiation is typically jeopardized due to the large momentum mismatch with free space. Here, we propose and theoretically investigate optically thin metallic films as an ideal platform for high-radiative-efficiency plasmonics. For far-field scattering, adding a thin high-quality metallic substrate enables a higher quality factor while maintaining the localization and tunability that the nanoparticle provides. For near-field spontaneous emission, a thin metallic substrate, of high quality or not, greatly improves the field overlap between the emitter environment and propagating surface plasmons, enabling high-Purcell (total enhancement >10[superscript 4]), high-quantum-yield (>50%) spontaneous emission, even as the gap size vanishes (3–5 nm). The enhancement has almost spatially independent efficiency and does not suffer from quenching effects that commonly exist in previous structures. National Science Foundation (U.S.). Materials Research Science and Engineering Centers (Program) (Grant DMR-1419807) United States. Department of Energy. Office of Science. Solid-State Solar Thermal Energy Conversion Center (Grant de-sc0001299) United States-Israel Binational Science Foundation (Award 2013508) Massachusetts Institute of Technology. Institute for Soldier Nanotechnologies (Contract W911NF-13-D-0001) 2017-06-15T14:37:34Z 2017-06-15T14:37:34Z 2016-05 2016-02 Article http://purl.org/eprint/type/JournalArticle 1530-6984 1530-6992 http://hdl.handle.net/1721.1/109886 Yang, Yi et al. “Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics.” Nano Letters 16.7 (2016): 4110–4117. https://orcid.org/0000-0003-2879-4968 https://orcid.org/0000-0002-7572-4594 https://orcid.org/0000-0002-7184-5831 https://orcid.org/0000-0003-2745-2392 https://orcid.org/0000-0002-7244-3682 en_US http://dx.doi.org/10.1021/acs.nanolett.6b00853 Nano Letters application/pdf American Chemical Society (ACS) MIT Web Domain |
| spellingShingle | Hsu, Chia Wei Miller, Owen D. Yang, Yi Zhen, Bo Soljacic, Marin Joannopoulos, John Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics |
| title | Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics |
| title_full | Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics |
| title_fullStr | Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics |
| title_full_unstemmed | Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics |
| title_short | Optically Thin Metallic Films for High-Radiative-Efficiency Plasmonics |
| title_sort | optically thin metallic films for high radiative efficiency plasmonics |
| url | http://hdl.handle.net/1721.1/109886 https://orcid.org/0000-0003-2879-4968 https://orcid.org/0000-0002-7572-4594 https://orcid.org/0000-0002-7184-5831 https://orcid.org/0000-0003-2745-2392 https://orcid.org/0000-0002-7244-3682 |
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