Ultra-high aspect ratio functional nanoporous silicon via nucleated catalysts

Nanoporous silicon (NPSi) has drawn recent interest because of its potential in a range of applications such as battery anodes, photocatalysis, thermoelectrics, and filtration membranes. However, the inexpensive and scalable manufacturing of high aspect ratio porous structures on the nanometer scale...

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Main Authors: Patil, Jatin J., Smith, Brendan Derek, Grossman, Jeffrey C.
Other Authors: Massachusetts Institute of Technology. Department of Materials Science and Engineering
Format: Article
Published: Royal Society of Chemistry (RSC) 2017
Online Access:http://hdl.handle.net/1721.1/111832
https://orcid.org/0000-0001-5255-6957
https://orcid.org/0000-0003-1281-2359
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author Patil, Jatin J.
Smith, Brendan Derek
Grossman, Jeffrey C.
author2 Massachusetts Institute of Technology. Department of Materials Science and Engineering
author_facet Massachusetts Institute of Technology. Department of Materials Science and Engineering
Patil, Jatin J.
Smith, Brendan Derek
Grossman, Jeffrey C.
author_sort Patil, Jatin J.
collection MIT
description Nanoporous silicon (NPSi) has drawn recent interest because of its potential in a range of applications such as battery anodes, photocatalysis, thermoelectrics, and filtration membranes. However, the inexpensive and scalable manufacturing of high aspect ratio porous structures on the nanometer scale has been difficult due to the reliance of current methods on complex and expensive equipment used for techniques such as anodization or photolithography. Here, we report a method of producing NPSi with sub-10 nm pore sizes and aspect ratios as high as 400 : 1 by leveraging the nucleation of sputtered noble metals on the Si surface, followed by metal-assisted chemical etching (MACE). The technique is capable of producing NPSi in an intrinsically scalable manner. Samples are characterized with SEM and TEM, along with vertical and horizontal FIB cross-sectional milling to elucidate the porous structure at several μm of depth within the substrate. Following preparation of the NPSi, it is functionalized with Al 2 O 3 and TiO 2 via atomic layer deposition (ALD). TiO 2 -functionalized NPSi exhibits reflectivity of 6-8% for visible wavelengths, and 2-3% in the infrared-showing its promise as a robust and functional porous substrate. The developed approach of employing MACE with sputtered nucleated catalysts facilitates the scalable fabrication of functional ultra-high aspect-ratio nanopores in silicon.
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spelling mit-1721.1/1118322022-09-30T11:54:04Z Ultra-high aspect ratio functional nanoporous silicon via nucleated catalysts Patil, Jatin J. Smith, Brendan Derek Grossman, Jeffrey C. Massachusetts Institute of Technology. Department of Materials Science and Engineering Smith, Brendan Derek Grossman, Jeffrey C. Nanoporous silicon (NPSi) has drawn recent interest because of its potential in a range of applications such as battery anodes, photocatalysis, thermoelectrics, and filtration membranes. However, the inexpensive and scalable manufacturing of high aspect ratio porous structures on the nanometer scale has been difficult due to the reliance of current methods on complex and expensive equipment used for techniques such as anodization or photolithography. Here, we report a method of producing NPSi with sub-10 nm pore sizes and aspect ratios as high as 400 : 1 by leveraging the nucleation of sputtered noble metals on the Si surface, followed by metal-assisted chemical etching (MACE). The technique is capable of producing NPSi in an intrinsically scalable manner. Samples are characterized with SEM and TEM, along with vertical and horizontal FIB cross-sectional milling to elucidate the porous structure at several μm of depth within the substrate. Following preparation of the NPSi, it is functionalized with Al 2 O 3 and TiO 2 via atomic layer deposition (ALD). TiO 2 -functionalized NPSi exhibits reflectivity of 6-8% for visible wavelengths, and 2-3% in the infrared-showing its promise as a robust and functional porous substrate. The developed approach of employing MACE with sputtered nucleated catalysts facilitates the scalable fabrication of functional ultra-high aspect-ratio nanopores in silicon. 2017-10-11T10:40:29Z 2017-10-11T10:40:29Z 2017-02 2017-01 2017-10-10T15:52:44Z Article http://purl.org/eprint/type/JournalArticle 2046-2069 http://hdl.handle.net/1721.1/111832 Patil, Jatin J. et al. “Ultra-High Aspect Ratio Functional Nanoporous Silicon via Nucleated Catalysts.” RSC Advances 7, 19 (2017): 11537–11542 © The Royal Society of Chemistry https://orcid.org/0000-0001-5255-6957 https://orcid.org/0000-0003-1281-2359 http://dx.doi.org/10.1039/C7RA00562H RSC Advances Creative Commons Attribution 3.0 Unported license http://creativecommons.org/licenses/by/3.0/ application/pdf Royal Society of Chemistry (RSC) Royal Society of Chemistry
spellingShingle Patil, Jatin J.
Smith, Brendan Derek
Grossman, Jeffrey C.
Ultra-high aspect ratio functional nanoporous silicon via nucleated catalysts
title Ultra-high aspect ratio functional nanoporous silicon via nucleated catalysts
title_full Ultra-high aspect ratio functional nanoporous silicon via nucleated catalysts
title_fullStr Ultra-high aspect ratio functional nanoporous silicon via nucleated catalysts
title_full_unstemmed Ultra-high aspect ratio functional nanoporous silicon via nucleated catalysts
title_short Ultra-high aspect ratio functional nanoporous silicon via nucleated catalysts
title_sort ultra high aspect ratio functional nanoporous silicon via nucleated catalysts
url http://hdl.handle.net/1721.1/111832
https://orcid.org/0000-0001-5255-6957
https://orcid.org/0000-0003-1281-2359
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