Semibatch monomer addition as a general method to tune and enhance the mechanics of polymer networks via loop-defect control

Controlling the molecular structure of amorphous cross-linked polymeric materials is a longstanding challenge. Herein, we disclose a general strategy for precise tuning of loop defects in covalent polymer gel networks. This "loop control" is achieved through a simple semibatch monomer addi...

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Main Authors: Hore, Michael J. A., Jordan, Alex M., Korley, LaShanda T. J., Gu, Yuwei, Kawamoto, Ken, Zhong, Mingjiang, Chen, Mao, Olsen, Bradley D, Johnson, Jeremiah A.
Other Authors: Massachusetts Institute of Technology. Department of Chemical Engineering
Format: Article
Published: National Academy of Sciences 2018
Online Access:http://hdl.handle.net/1721.1/113239
https://orcid.org/0000-0002-9604-7764
https://orcid.org/0000-0002-8289-8525
https://orcid.org/0000-0001-7533-4708
https://orcid.org/0000-0002-7374-8680
https://orcid.org/0000-0002-7272-7140
https://orcid.org/0000-0001-9157-6491
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author Hore, Michael J. A.
Jordan, Alex M.
Korley, LaShanda T. J.
Gu, Yuwei
Kawamoto, Ken
Zhong, Mingjiang
Chen, Mao
Olsen, Bradley D
Johnson, Jeremiah A.
author2 Massachusetts Institute of Technology. Department of Chemical Engineering
author_facet Massachusetts Institute of Technology. Department of Chemical Engineering
Hore, Michael J. A.
Jordan, Alex M.
Korley, LaShanda T. J.
Gu, Yuwei
Kawamoto, Ken
Zhong, Mingjiang
Chen, Mao
Olsen, Bradley D
Johnson, Jeremiah A.
author_sort Hore, Michael J. A.
collection MIT
description Controlling the molecular structure of amorphous cross-linked polymeric materials is a longstanding challenge. Herein, we disclose a general strategy for precise tuning of loop defects in covalent polymer gel networks. This "loop control" is achieved through a simple semibatch monomer addition protocol that can be applied to a broad range of network-forming reactions. By controlling loop defects, we demonstrate that with the same set of material precursors it is possible to tune and in several cases substantially improve network connectivity and mechanical properties (e.g., ∼600% increase in shear storage modulus). We believe that the concept of loop control via continuous reagent addition could find broad application in the synthesis of academically and industrially important cross-linked polymeric materials, such as resins and gels.
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spelling mit-1721.1/1132392019-05-17T07:57:18Z Semibatch monomer addition as a general method to tune and enhance the mechanics of polymer networks via loop-defect control Hore, Michael J. A. Jordan, Alex M. Korley, LaShanda T. J. Gu, Yuwei Kawamoto, Ken Zhong, Mingjiang Chen, Mao Olsen, Bradley D Johnson, Jeremiah A. Massachusetts Institute of Technology. Department of Chemical Engineering Massachusetts Institute of Technology. Department of Chemistry Gu, Yuwei Kawamoto, Ken Zhong, Mingjiang Chen, Mao Olsen, Bradley D Johnson, Jeremiah A. Controlling the molecular structure of amorphous cross-linked polymeric materials is a longstanding challenge. Herein, we disclose a general strategy for precise tuning of loop defects in covalent polymer gel networks. This "loop control" is achieved through a simple semibatch monomer addition protocol that can be applied to a broad range of network-forming reactions. By controlling loop defects, we demonstrate that with the same set of material precursors it is possible to tune and in several cases substantially improve network connectivity and mechanical properties (e.g., ∼600% increase in shear storage modulus). We believe that the concept of loop control via continuous reagent addition could find broad application in the synthesis of academically and industrially important cross-linked polymeric materials, such as resins and gels. National Science Foundation (U.S.) (CHE-1334703) 2018-01-19T18:42:33Z 2018-01-19T18:42:33Z 2017-04 2016-12 2018-01-17T12:44:47Z Article http://purl.org/eprint/type/JournalArticle 0027-8424 1091-6490 http://hdl.handle.net/1721.1/113239 Gu, Yuwei, et al. “Semibatch Monomer Addition as a General Method to Tune and Enhance the Mechanics of Polymer Networks via Loop-Defect Control.” Proceedings of the National Academy of Sciences, vol. 114, no. 19, May 2017, pp. 4875–80. © 2018 National Academy of Sciences PUBLISHER_POLICY https://orcid.org/0000-0002-9604-7764 https://orcid.org/0000-0002-8289-8525 https://orcid.org/0000-0001-7533-4708 https://orcid.org/0000-0002-7374-8680 https://orcid.org/0000-0002-7272-7140 https://orcid.org/0000-0001-9157-6491 http://dx.doi.org/10.1073/PNAS.1620985114 Proceedings of the National Academy of Sciences Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/octet-stream National Academy of Sciences PNAS
spellingShingle Hore, Michael J. A.
Jordan, Alex M.
Korley, LaShanda T. J.
Gu, Yuwei
Kawamoto, Ken
Zhong, Mingjiang
Chen, Mao
Olsen, Bradley D
Johnson, Jeremiah A.
Semibatch monomer addition as a general method to tune and enhance the mechanics of polymer networks via loop-defect control
title Semibatch monomer addition as a general method to tune and enhance the mechanics of polymer networks via loop-defect control
title_full Semibatch monomer addition as a general method to tune and enhance the mechanics of polymer networks via loop-defect control
title_fullStr Semibatch monomer addition as a general method to tune and enhance the mechanics of polymer networks via loop-defect control
title_full_unstemmed Semibatch monomer addition as a general method to tune and enhance the mechanics of polymer networks via loop-defect control
title_short Semibatch monomer addition as a general method to tune and enhance the mechanics of polymer networks via loop-defect control
title_sort semibatch monomer addition as a general method to tune and enhance the mechanics of polymer networks via loop defect control
url http://hdl.handle.net/1721.1/113239
https://orcid.org/0000-0002-9604-7764
https://orcid.org/0000-0002-8289-8525
https://orcid.org/0000-0001-7533-4708
https://orcid.org/0000-0002-7374-8680
https://orcid.org/0000-0002-7272-7140
https://orcid.org/0000-0001-9157-6491
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