10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process
Bowtie plasmonic apertures, with gap sizes down to 11 nm and silver film thickness of up to 150 nm (aspect ratio 14:1), were fabricated on a silicon nitride membrane. Transmission spectra feature the aperture resonances ranging from 470 to 687 nm, with quality factors around 10. The mode area of the...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | en_US |
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American Institute of Physics (AIP)
2018
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| Online Access: | http://hdl.handle.net/1721.1/113345 https://orcid.org/0000-0003-2220-4365 |
| _version_ | 1826189549221445632 |
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| author | Huang, I-Chun Holzgrafe, Jeffrey Choy, Jennifer T. Lončar, Marko Jensen, Russell Andrew Bawendi, Moungi G |
| author2 | Massachusetts Institute of Technology. Department of Chemistry |
| author_facet | Massachusetts Institute of Technology. Department of Chemistry Huang, I-Chun Holzgrafe, Jeffrey Choy, Jennifer T. Lončar, Marko Jensen, Russell Andrew Bawendi, Moungi G |
| author_sort | Huang, I-Chun |
| collection | MIT |
| description | Bowtie plasmonic apertures, with gap sizes down to 11 nm and silver film thickness of up to 150 nm (aspect ratio 14:1), were fabricated on a silicon nitride membrane. Transmission spectra feature the aperture resonances ranging from 470 to 687 nm, with quality factors around 10. The mode area of the smallest gap aperture is estimated to be as small as 0.002 (k/n)[superscript 2] using numerical modeling. Importantly, our fabrication technique, based on an e-beam lithography and a lift-off process, is scalable which allows fabrication of many devices in parallel over a relatively large
area. We believe that the devices demonstrated in this work will find application in studying and engineering light-matter interactions. |
| first_indexed | 2024-09-23T08:16:42Z |
| format | Article |
| id | mit-1721.1/113345 |
| institution | Massachusetts Institute of Technology |
| language | en_US |
| last_indexed | 2024-09-23T08:16:42Z |
| publishDate | 2018 |
| publisher | American Institute of Physics (AIP) |
| record_format | dspace |
| spelling | mit-1721.1/1133452022-09-30T08:48:02Z 10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process Huang, I-Chun Holzgrafe, Jeffrey Choy, Jennifer T. Lončar, Marko Jensen, Russell Andrew Bawendi, Moungi G Massachusetts Institute of Technology. Department of Chemistry Jensen, Russell Andrew Bawendi, Moungi G Bowtie plasmonic apertures, with gap sizes down to 11 nm and silver film thickness of up to 150 nm (aspect ratio 14:1), were fabricated on a silicon nitride membrane. Transmission spectra feature the aperture resonances ranging from 470 to 687 nm, with quality factors around 10. The mode area of the smallest gap aperture is estimated to be as small as 0.002 (k/n)[superscript 2] using numerical modeling. Importantly, our fabrication technique, based on an e-beam lithography and a lift-off process, is scalable which allows fabrication of many devices in parallel over a relatively large area. We believe that the devices demonstrated in this work will find application in studying and engineering light-matter interactions. 2018-01-30T15:47:33Z 2018-01-30T15:47:33Z 2016-09 2016-06 Article http://purl.org/eprint/type/JournalArticle 0003-6951 1077-3118 http://hdl.handle.net/1721.1/113345 Huang, I. Chun, et al. “10 Nm Gap Bowtie Plasmonic Apertures Fabricated by Modified Lift-off Process.” Applied Physics Letters, vol. 109, no. 13, Sept. 2016, p. 133105. © 2016 AIP Publishing LLC https://orcid.org/0000-0003-2220-4365 en_US https://doi.org/10.1063/1.4963689 Applied Physics Letters Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf American Institute of Physics (AIP) Other univ. web domain |
| spellingShingle | Huang, I-Chun Holzgrafe, Jeffrey Choy, Jennifer T. Lončar, Marko Jensen, Russell Andrew Bawendi, Moungi G 10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process |
| title | 10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process |
| title_full | 10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process |
| title_fullStr | 10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process |
| title_full_unstemmed | 10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process |
| title_short | 10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process |
| title_sort | 10 nm gap bowtie plasmonic apertures fabricated by modified lift off process |
| url | http://hdl.handle.net/1721.1/113345 https://orcid.org/0000-0003-2220-4365 |
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