Impact of 2D-Graphene on SiN Passivated AlGaN/GaN MIS-HEMTs Under Mist Exposure

The effect of a 2D graphene layer (GL) on top of the silicon nitride (SiN) passivation layer of AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors has been systematically analyzed. Results showed that in the devices without the GL, the maximum drain current density (I-D,max)...

ver descrição completa

Detalhes bibliográficos
Autor principal: Palacios, Tomas
Outros Autores: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Formato: Artigo
Idioma:English
Publicado em: Institute of Electrical and Electronics Engineers (IEEE) 2019
Acesso em linha:https://hdl.handle.net/1721.1/121508