Time-Dependent Dielectric Breakdown in High-Voltage GaN MIS-HEMTs: The Role of Temperature
We have investigated time-dependent dielectric breakdown in high-voltage AlGaN/GaN metal-insulator-semiconductor high-electron mobility transistors, with a focus specifically on the role of temperature under positive gate stress conditions. We aim toward understanding the temperature dependence of p...
Main Authors: | Warnock, Shireen M., Lemus, Allison, Joh, Jungwoo, Krishnan, Srikanth, Pendharkar, Sameer, del Alamo, Jesus A |
---|---|
Other Authors: | Massachusetts Institute of Technology. Microsystems Technology Laboratories |
Format: | Article |
Published: |
Institute of Electrical and Electronics Engineers (IEEE)
2020
|
Online Access: | https://hdl.handle.net/1721.1/126183 |
Similar Items
-
Time-Dependent Dielectric Breakdown Under AC Stress in GaN MIS-HEMTs
by: Lee, Ethan S, et al.
Published: (2021) -
Gate-geometry dependence of electrical characteristics of p-GaN gate HEMTs
by: Lee, Ethan S, et al.
Published: (2022) -
A model for the critical voltage for electrical degradation of GaN high electron mobility transistors
by: Joh, Jungwoo, et al.
Published: (2010) -
Time evolution of electrical degradation under high-voltage stress in GaN high electron mobility transistors
by: Joh, Jungwoo, et al.
Published: (2012) -
Evaluation and Reliability Assessment of GaN-on-Si MIS-HEMT for Power Switching Applications
by: Chou, Po-Chien, et al.
Published: (2017)