Mapping Photoemission and Hot-Electron Emission from Plasmonic Nanoantennas

© 2017 American Chemical Society. Understanding plasmon-mediated electron emission and energy transfer on the nanometer length scale is critical to controlling light-matter interactions at nanoscale dimensions. In a high-resolution lithographic material, electron emission and energy transfer lead to...

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Main Authors: Hobbs, Richard G, Putnam, William P, Fallahi, Arya, Yang, Yujia, Kärtner, Franz X, Berggren, Karl K
Other Authors: Massachusetts Institute of Technology. Research Laboratory of Electronics
Format: Article
Language:English
Published: American Chemical Society (ACS) 2021
Online Access:https://hdl.handle.net/1721.1/133427
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author Hobbs, Richard G
Putnam, William P
Fallahi, Arya
Yang, Yujia
Kärtner, Franz X
Berggren, Karl K
author2 Massachusetts Institute of Technology. Research Laboratory of Electronics
author_facet Massachusetts Institute of Technology. Research Laboratory of Electronics
Hobbs, Richard G
Putnam, William P
Fallahi, Arya
Yang, Yujia
Kärtner, Franz X
Berggren, Karl K
author_sort Hobbs, Richard G
collection MIT
description © 2017 American Chemical Society. Understanding plasmon-mediated electron emission and energy transfer on the nanometer length scale is critical to controlling light-matter interactions at nanoscale dimensions. In a high-resolution lithographic material, electron emission and energy transfer lead to chemical transformations. In this work, we employ such chemical transformations in two different high-resolution electron-beam lithography resists, poly(methyl methacrylate) (PMMA) and hydrogen silsesquioxane (HSQ), to map local electron emission and energy transfer with nanometer resolution from plasmonic nanoantennas excited by femtosecond laser pulses. We observe exposure of the electron-beam resists (both PMMA and HSQ) in regions on the surface of nanoantennas where the local field is significantly enhanced. Exposure in these regions is consistent with previously reported optical-field-controlled electron emission from plasmonic hotspots as well as earlier work on low-electron-energy scanning probe lithography. For HSQ, in addition to exposure in hotspots, we observe resist exposure at the centers of rod-shaped nanoantennas in addition to exposure in plasmonic hotspots. Optical field enhancement is minimized at the center of nanorods suggesting that exposure in these regions involves a different mechanism to that in plasmonic hotspots. Our simulations suggest that exposure at the center of nanorods results from the emission of hot electrons produced via plasmon decay in the nanorods. Overall, the results presented in this work provide a means to map both optical-field-controlled electron emission and hot-electron transfer from nanoparticles via chemical transformations produced locally in lithographic materials.
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spelling mit-1721.1/1334272023-02-28T21:08:14Z Mapping Photoemission and Hot-Electron Emission from Plasmonic Nanoantennas Hobbs, Richard G Putnam, William P Fallahi, Arya Yang, Yujia Kärtner, Franz X Berggren, Karl K Massachusetts Institute of Technology. Research Laboratory of Electronics © 2017 American Chemical Society. Understanding plasmon-mediated electron emission and energy transfer on the nanometer length scale is critical to controlling light-matter interactions at nanoscale dimensions. In a high-resolution lithographic material, electron emission and energy transfer lead to chemical transformations. In this work, we employ such chemical transformations in two different high-resolution electron-beam lithography resists, poly(methyl methacrylate) (PMMA) and hydrogen silsesquioxane (HSQ), to map local electron emission and energy transfer with nanometer resolution from plasmonic nanoantennas excited by femtosecond laser pulses. We observe exposure of the electron-beam resists (both PMMA and HSQ) in regions on the surface of nanoantennas where the local field is significantly enhanced. Exposure in these regions is consistent with previously reported optical-field-controlled electron emission from plasmonic hotspots as well as earlier work on low-electron-energy scanning probe lithography. For HSQ, in addition to exposure in hotspots, we observe resist exposure at the centers of rod-shaped nanoantennas in addition to exposure in plasmonic hotspots. Optical field enhancement is minimized at the center of nanorods suggesting that exposure in these regions involves a different mechanism to that in plasmonic hotspots. Our simulations suggest that exposure at the center of nanorods results from the emission of hot electrons produced via plasmon decay in the nanorods. Overall, the results presented in this work provide a means to map both optical-field-controlled electron emission and hot-electron transfer from nanoparticles via chemical transformations produced locally in lithographic materials. 2021-10-27T19:52:48Z 2021-10-27T19:52:48Z 2017 2019-05-08T16:50:04Z Article http://purl.org/eprint/type/JournalArticle https://hdl.handle.net/1721.1/133427 en 10.1021/ACS.NANOLETT.7B02495 Nano Letters Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf American Chemical Society (ACS) Other repository
spellingShingle Hobbs, Richard G
Putnam, William P
Fallahi, Arya
Yang, Yujia
Kärtner, Franz X
Berggren, Karl K
Mapping Photoemission and Hot-Electron Emission from Plasmonic Nanoantennas
title Mapping Photoemission and Hot-Electron Emission from Plasmonic Nanoantennas
title_full Mapping Photoemission and Hot-Electron Emission from Plasmonic Nanoantennas
title_fullStr Mapping Photoemission and Hot-Electron Emission from Plasmonic Nanoantennas
title_full_unstemmed Mapping Photoemission and Hot-Electron Emission from Plasmonic Nanoantennas
title_short Mapping Photoemission and Hot-Electron Emission from Plasmonic Nanoantennas
title_sort mapping photoemission and hot electron emission from plasmonic nanoantennas
url https://hdl.handle.net/1721.1/133427
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