Probing the ultimate plasmon confinement limits with a van der Waals heterostructure

© 2017 The Authors. The ability to confine light into tiny spatial dimensions is important for applications such as microscopy, sensing, and nanoscale lasers. Although plasmons offer an appealing avenue to confine light, Landau damping in metals imposes a trade-off between optical field confinement...

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Main Authors: Alcaraz Iranzo, David, Nanot, Sébastien, Dias, Eduardo JC, Epstein, Itai, Peng, Cheng, Efetov, Dmitri K, Lundeberg, Mark B, Parret, Romain, Osmond, Johann, Hong, Jin-Yong, Kong, Jing, Englund, Dirk R, Peres, Nuno MR, Koppens, Frank HL
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Format: Article
Language:English
Published: American Association for the Advancement of Science (AAAS) 2021
Online Access:https://hdl.handle.net/1721.1/135017
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author Alcaraz Iranzo, David
Nanot, Sébastien
Dias, Eduardo JC
Epstein, Itai
Peng, Cheng
Efetov, Dmitri K
Lundeberg, Mark B
Parret, Romain
Osmond, Johann
Hong, Jin-Yong
Kong, Jing
Englund, Dirk R
Peres, Nuno MR
Koppens, Frank HL
author2 Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
author_facet Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Alcaraz Iranzo, David
Nanot, Sébastien
Dias, Eduardo JC
Epstein, Itai
Peng, Cheng
Efetov, Dmitri K
Lundeberg, Mark B
Parret, Romain
Osmond, Johann
Hong, Jin-Yong
Kong, Jing
Englund, Dirk R
Peres, Nuno MR
Koppens, Frank HL
author_sort Alcaraz Iranzo, David
collection MIT
description © 2017 The Authors. The ability to confine light into tiny spatial dimensions is important for applications such as microscopy, sensing, and nanoscale lasers. Although plasmons offer an appealing avenue to confine light, Landau damping in metals imposes a trade-off between optical field confinement and losses. We show that a graphene-insulator-metal heterostructure can overcome that trade-off, and demonstrate plasmon confinement down to the ultimate limit of the length scale of one atom. This is achieved through far-field excitation of plasmon modes squeezed into an atomically thin hexagonal boron nitride dielectric spacer between graphene and metal rods. A theoretical model that takes into account the nonlocal optical response of both graphene and metal is used to describe the results. These ultraconfined plasmonic modes, addressed with far-field light excitation, enable a route to new regimes of ultrastrong light-matter interactions.
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spelling mit-1721.1/1350172023-02-23T16:32:23Z Probing the ultimate plasmon confinement limits with a van der Waals heterostructure Alcaraz Iranzo, David Nanot, Sébastien Dias, Eduardo JC Epstein, Itai Peng, Cheng Efetov, Dmitri K Lundeberg, Mark B Parret, Romain Osmond, Johann Hong, Jin-Yong Kong, Jing Englund, Dirk R Peres, Nuno MR Koppens, Frank HL Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science © 2017 The Authors. The ability to confine light into tiny spatial dimensions is important for applications such as microscopy, sensing, and nanoscale lasers. Although plasmons offer an appealing avenue to confine light, Landau damping in metals imposes a trade-off between optical field confinement and losses. We show that a graphene-insulator-metal heterostructure can overcome that trade-off, and demonstrate plasmon confinement down to the ultimate limit of the length scale of one atom. This is achieved through far-field excitation of plasmon modes squeezed into an atomically thin hexagonal boron nitride dielectric spacer between graphene and metal rods. A theoretical model that takes into account the nonlocal optical response of both graphene and metal is used to describe the results. These ultraconfined plasmonic modes, addressed with far-field light excitation, enable a route to new regimes of ultrastrong light-matter interactions. 2021-10-27T20:10:20Z 2021-10-27T20:10:20Z 2018 2019-06-14T16:15:59Z Article http://purl.org/eprint/type/JournalArticle https://hdl.handle.net/1721.1/135017 en 10.1126/SCIENCE.AAR8438 Science Creative Commons Attribution-Noncommercial-Share Alike http://creativecommons.org/licenses/by-nc-sa/4.0/ application/pdf American Association for the Advancement of Science (AAAS) arXiv
spellingShingle Alcaraz Iranzo, David
Nanot, Sébastien
Dias, Eduardo JC
Epstein, Itai
Peng, Cheng
Efetov, Dmitri K
Lundeberg, Mark B
Parret, Romain
Osmond, Johann
Hong, Jin-Yong
Kong, Jing
Englund, Dirk R
Peres, Nuno MR
Koppens, Frank HL
Probing the ultimate plasmon confinement limits with a van der Waals heterostructure
title Probing the ultimate plasmon confinement limits with a van der Waals heterostructure
title_full Probing the ultimate plasmon confinement limits with a van der Waals heterostructure
title_fullStr Probing the ultimate plasmon confinement limits with a van der Waals heterostructure
title_full_unstemmed Probing the ultimate plasmon confinement limits with a van der Waals heterostructure
title_short Probing the ultimate plasmon confinement limits with a van der Waals heterostructure
title_sort probing the ultimate plasmon confinement limits with a van der waals heterostructure
url https://hdl.handle.net/1721.1/135017
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