Sub-micron gate lithography in an MMIC production environment
Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1990, and Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering, 1990.
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| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1721.1/13600 |
| _version_ | 1826215641255772160 |
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| author | Moran, Peter William |
| author2 | Rebecca M. Henderson and Jesús A. del Alamo. |
| author_facet | Rebecca M. Henderson and Jesús A. del Alamo. Moran, Peter William |
| author_sort | Moran, Peter William |
| collection | MIT |
| description | Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1990, and Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering, 1990. |
| first_indexed | 2024-09-23T16:37:09Z |
| format | Thesis |
| id | mit-1721.1/13600 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T16:37:09Z |
| publishDate | 2005 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/136002022-01-26T20:57:06Z Sub-micron gate lithography in an MMIC production environment Moran, Peter William Rebecca M. Henderson and Jesús A. del Alamo. Massachusetts Institute of Technology. Department of Electrical Engineering Sloan School of Management Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Sloan School of Management Electrical Engineering Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1990, and Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering, 1990. Includes bibliographical references (leaves 195-197). by Peter William Moran. M.S. 2005-08-10T22:16:04Z 2005-08-10T22:16:04Z 1990 1990 Thesis http://hdl.handle.net/1721.1/13600 24154943 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 199 leaves 12487268 bytes 12487026 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology |
| spellingShingle | Sloan School of Management Electrical Engineering Moran, Peter William Sub-micron gate lithography in an MMIC production environment |
| title | Sub-micron gate lithography in an MMIC production environment |
| title_full | Sub-micron gate lithography in an MMIC production environment |
| title_fullStr | Sub-micron gate lithography in an MMIC production environment |
| title_full_unstemmed | Sub-micron gate lithography in an MMIC production environment |
| title_short | Sub-micron gate lithography in an MMIC production environment |
| title_sort | sub micron gate lithography in an mmic production environment |
| topic | Sloan School of Management Electrical Engineering |
| url | http://hdl.handle.net/1721.1/13600 |
| work_keys_str_mv | AT moranpeterwilliam submicrongatelithographyinanmmicproductionenvironment |