Sub-micron gate lithography in an MMIC production environment

Sub-micron gate lithography in an MMIC production environment

Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1990, and Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering, 1990.

Bibliographic Details
Main Author: Moran, Peter William
Other Authors: Rebecca M. Henderson and Jesús A. del Alamo.
Format: Thesis
Language:eng
Published: Massachusetts Institute of Technology 2005
Subjects:
Sloan School of Management
Electrical Engineering
Online Access:http://hdl.handle.net/1721.1/13600

Internet

http://hdl.handle.net/1721.1/13600

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