Nanoporous Silicon-Assisted Patterning of Monolayer MoS 2 with Thermally Controlled Porosity: A Scalable Method for Diverse Applications

Nanoporous Silicon-Assisted Patterning of Monolayer MoS 2 with Thermally Controlled Porosity: A Scalable Method for Diverse Applications

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© 2018 American Chemical Society. Nanoscale pore formation on chemical vapor deposition grown monolayer MoS2 is achieved using oxygen plasma etching through a nanoporous silicon mask, creating round pores of â70 nm in diameter. The microscale areas with high porosity were successfully patterned via...

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Bibliographic Details
Main Authors: Han, Grace GD, Smith, Brendan D, Xu, Wenshuo, Warner, Jamie H, Grossman, Jeffrey C
Format: Article
Language:English
Published: American Chemical Society (ACS) 2021
Online Access:https://hdl.handle.net/1721.1/136358

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