High‐Pressure‐Sintering‐Induced Microstructural Engineering for an Ultimate Phonon Scattering of Thermoelectric Half‐Heusler Compounds

High‐Pressure‐Sintering‐Induced Microstructural Engineering for an Ultimate Phonon Scattering of Thermoelectric Half‐Heusler Compounds

Thermal management is of vital importance in various modern technologies such as portable electronics, photovoltaics, and thermoelectric devices. Impeding phonon transport remains one of the most challenging tasks for improving the thermoelectric performance of certain materials such as half-Heusler...

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Bibliographic Details
Main Authors: He, Ran, Zhu, Taishan, Ying, Pingjun, Chen, Jie, Giebeler, Lars, Kühn, Uta, Grossman, Jeffrey C, Wang, Yumei, Nielsch, Kornelius
Other Authors: Massachusetts Institute of Technology. Department of Materials Science and Engineering
Format: Article
Language:English
Published: Wiley 2022
Online Access:https://hdl.handle.net/1721.1/141268

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https://hdl.handle.net/1721.1/141268

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