Tuning band alignment at a semiconductor-crystalline oxide heterojunction via electrostatic modulation of the interfacial dipole

Bibliographic Details
Main Authors: Chrysler, M, Gabel, J, Lee, T-L, Penn, AN, Matthews, BE, Kepaptsoglou, DM, Ramasse, QM, Paudel, JR, Sah, RK, Grassi, JD, Zhu, Z, Gray, AX, LeBeau, JM, Spurgeon, SR, Chambers, SA, Sushko, PV, Ngai, JH
Other Authors: Massachusetts Institute of Technology. Department of Materials Science and Engineering
Format: Article
Language:English
Published: American Physical Society (APS) 2022
Online Access:https://hdl.handle.net/1721.1/142615
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author Chrysler, M
Gabel, J
Lee, T-L
Penn, AN
Matthews, BE
Kepaptsoglou, DM
Ramasse, QM
Paudel, JR
Sah, RK
Grassi, JD
Zhu, Z
Gray, AX
LeBeau, JM
Spurgeon, SR
Chambers, SA
Sushko, PV
Ngai, JH
author2 Massachusetts Institute of Technology. Department of Materials Science and Engineering
author_facet Massachusetts Institute of Technology. Department of Materials Science and Engineering
Chrysler, M
Gabel, J
Lee, T-L
Penn, AN
Matthews, BE
Kepaptsoglou, DM
Ramasse, QM
Paudel, JR
Sah, RK
Grassi, JD
Zhu, Z
Gray, AX
LeBeau, JM
Spurgeon, SR
Chambers, SA
Sushko, PV
Ngai, JH
author_sort Chrysler, M
collection MIT
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institution Massachusetts Institute of Technology
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spelling mit-1721.1/1426152023-01-20T16:41:04Z Tuning band alignment at a semiconductor-crystalline oxide heterojunction via electrostatic modulation of the interfacial dipole Chrysler, M Gabel, J Lee, T-L Penn, AN Matthews, BE Kepaptsoglou, DM Ramasse, QM Paudel, JR Sah, RK Grassi, JD Zhu, Z Gray, AX LeBeau, JM Spurgeon, SR Chambers, SA Sushko, PV Ngai, JH Massachusetts Institute of Technology. Department of Materials Science and Engineering 2022-05-19T17:15:18Z 2022-05-19T17:15:18Z 2021 2022-05-19T17:04:55Z Article http://purl.org/eprint/type/JournalArticle https://hdl.handle.net/1721.1/142615 Chrysler, M, Gabel, J, Lee, T-L, Penn, AN, Matthews, BE et al. 2021. "Tuning band alignment at a semiconductor-crystalline oxide heterojunction via electrostatic modulation of the interfacial dipole." Physical Review Materials, 5 (10). en 10.1103/PHYSREVMATERIALS.5.104603 Physical Review Materials Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf American Physical Society (APS) APS
spellingShingle Chrysler, M
Gabel, J
Lee, T-L
Penn, AN
Matthews, BE
Kepaptsoglou, DM
Ramasse, QM
Paudel, JR
Sah, RK
Grassi, JD
Zhu, Z
Gray, AX
LeBeau, JM
Spurgeon, SR
Chambers, SA
Sushko, PV
Ngai, JH
Tuning band alignment at a semiconductor-crystalline oxide heterojunction via electrostatic modulation of the interfacial dipole
title Tuning band alignment at a semiconductor-crystalline oxide heterojunction via electrostatic modulation of the interfacial dipole
title_full Tuning band alignment at a semiconductor-crystalline oxide heterojunction via electrostatic modulation of the interfacial dipole
title_fullStr Tuning band alignment at a semiconductor-crystalline oxide heterojunction via electrostatic modulation of the interfacial dipole
title_full_unstemmed Tuning band alignment at a semiconductor-crystalline oxide heterojunction via electrostatic modulation of the interfacial dipole
title_short Tuning band alignment at a semiconductor-crystalline oxide heterojunction via electrostatic modulation of the interfacial dipole
title_sort tuning band alignment at a semiconductor crystalline oxide heterojunction via electrostatic modulation of the interfacial dipole
url https://hdl.handle.net/1721.1/142615
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