Electrostatically Levitated Object Handoff to Minimize Wear and Particle Generation
In semiconductor photolithography, feature sizes are reducing towards low nanometers using extreme ultraviolet (EUV) light, which requires exposure in vacuum. Even a few particles on surfaces in the optical path (such as reticles, lenses, and mirrors) pose critical limits on performance, yield, and...
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| フォーマット: | 学位論文 |
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Massachusetts Institute of Technology
2022
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| オンライン･アクセス: | https://hdl.handle.net/1721.1/143356 https://orcid.org/0000-0003-3351-0990 |