Electronegative metal dopants improve switching variability in Al2 O3 resistive switching devices
Main Authors: | Tan, Zheng Jie, Somjit, Vrindaa, Toparli, Cigdem, Yildiz, Bilge, Fang, Nicholas |
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Other Authors: | Massachusetts Institute of Technology. Department of Nuclear Science and Engineering |
Format: | Article |
Language: | English |
Published: |
American Physical Society (APS)
2023
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Online Access: | https://hdl.handle.net/1721.1/147710 |
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