Electronegative metal dopants improve switching variability in Al2 O3 resistive switching devices

Bibliographic Details
Main Authors: Tan, Zheng Jie, Somjit, Vrindaa, Toparli, Cigdem, Yildiz, Bilge, Fang, Nicholas
Other Authors: Massachusetts Institute of Technology. Department of Nuclear Science and Engineering
Format: Article
Language:English
Published: American Physical Society (APS) 2023
Online Access:https://hdl.handle.net/1721.1/147710

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