Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1986.
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| Other Authors: | |
| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1721.1/15045 |
| _version_ | 1826202691361046528 |
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| author | Allen, Kenneth Donald |
| author2 | Herbert H. Swain. |
| author_facet | Herbert H. Swain. Allen, Kenneth Donald |
| author_sort | Allen, Kenneth Donald |
| collection | MIT |
| description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1986. |
| first_indexed | 2024-09-23T12:14:36Z |
| format | Thesis |
| id | mit-1721.1/15045 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T12:14:36Z |
| publishDate | 2005 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/150452019-04-11T14:18:24Z Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges Allen, Kenneth Donald Herbert H. Swain. Massachusetts Institute of Technology. Dept. of Chemical Engineering. Massachusetts Institute of Technology. Dept. of Chemical Engineering. Chemical Engineering. Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1986. MICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE. Bibliography: leaves 319-340. by Kenneth Donald Allen. Ph.D. 2005-08-08T17:02:00Z 2005-08-08T17:02:00Z 1986 1986 Thesis http://hdl.handle.net/1721.1/15045 15495986 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 2 v. [406 leaves] 19889251 bytes 19889005 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology |
| spellingShingle | Chemical Engineering. Allen, Kenneth Donald Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges |
| title | Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges |
| title_full | Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges |
| title_fullStr | Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges |
| title_full_unstemmed | Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges |
| title_short | Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges |
| title_sort | modeling of the plasma etching of polysilicon with chloro and bromo trifluoromethane discharges |
| topic | Chemical Engineering. |
| url | http://hdl.handle.net/1721.1/15045 |
| work_keys_str_mv | AT allenkennethdonald modelingoftheplasmaetchingofpolysiliconwithchloroandbromotrifluoromethanedischarges |