Design of 3D Complex Nanostructures Using Block Copolymer Self-Assembly
The continuously pursuit of designing high quality complex nanostructures is required by the modern nanotechnology. However, the conventional 'top-down' lithography is limited by the rapidly increasing cost and difficulty when operating on length scales below 20 nm. As an alternative, bloc...
| المؤلف الرئيسي: | |
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| مؤلفون آخرون: | |
| التنسيق: | أطروحة |
| منشور في: |
Massachusetts Institute of Technology
2024
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| الوصول للمادة أونلاين: | https://hdl.handle.net/1721.1/153325 https://orcid.org/0000-0001-6040-6940 |