Remote epitaxy
Remote epitaxy is an emerging technology for producing single-crystalline, free-standing thin films and structures. The method uses 2D van der Waals materials as semi-transparent interlayers that enable epitaxy and release of epitaxial layers at the 2D layer interface. Although the principle of remo...
| Main Authors: | , , , , , , , , , , , , , , , , |
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| Format: | Article |
| Language: | English |
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Springer Science and Business Media LLC
2024
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| Online Access: | https://hdl.handle.net/1721.1/153597 |
| _version_ | 1811079806759993344 |
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| author | Kim, Hyunseok Chang, Celesta S. Lee, Sangho Jiang, Jie Jeong, Junseok Park, Minseong Meng, Yuan Ji, Jongho Kwon, Yeunwoo Sun, Xuechun Kong, Wei Kum, Hyun S. Bae, Sang-Hoon Lee, Kyusang Hong, Young Joon Shi, Jian Kim, Jeehwan |
| author_facet | Kim, Hyunseok Chang, Celesta S. Lee, Sangho Jiang, Jie Jeong, Junseok Park, Minseong Meng, Yuan Ji, Jongho Kwon, Yeunwoo Sun, Xuechun Kong, Wei Kum, Hyun S. Bae, Sang-Hoon Lee, Kyusang Hong, Young Joon Shi, Jian Kim, Jeehwan |
| author_sort | Kim, Hyunseok |
| collection | MIT |
| description | Remote epitaxy is an emerging technology for producing single-crystalline, free-standing thin films and structures. The method uses 2D van der Waals materials as semi-transparent interlayers that enable epitaxy and release of epitaxial layers at the 2D layer interface. Although the principle of remote epitaxy is simple, it is often challenging to perform owing to stringent requirements for sample preparation and procedure control. This Primer provides extensive guidelines on remote epitaxy techniques, from preparing 2D materials to epitaxy processes and layer transfer methods. Depending on the material of interest, the procedure used can vary, which affects the quality. Consequently, in this Primer, key considerations and characterization techniques are provided for respective families of materials. These are intended as a stepping stone to expand the available material choice and improve the quality of materials grown by remote epitaxy. Lastly, the current limitations, possible solutions and future directions of remote epitaxy and its applications are discussed. |
| first_indexed | 2024-09-23T11:20:45Z |
| format | Article |
| id | mit-1721.1/153597 |
| institution | Massachusetts Institute of Technology |
| language | English |
| last_indexed | 2024-09-23T11:20:45Z |
| publishDate | 2024 |
| publisher | Springer Science and Business Media LLC |
| record_format | dspace |
| spelling | mit-1721.1/1535972024-02-28T03:44:51Z Remote epitaxy Kim, Hyunseok Chang, Celesta S. Lee, Sangho Jiang, Jie Jeong, Junseok Park, Minseong Meng, Yuan Ji, Jongho Kwon, Yeunwoo Sun, Xuechun Kong, Wei Kum, Hyun S. Bae, Sang-Hoon Lee, Kyusang Hong, Young Joon Shi, Jian Kim, Jeehwan General Medicine General Biochemistry, Genetics and Molecular Biology Remote epitaxy is an emerging technology for producing single-crystalline, free-standing thin films and structures. The method uses 2D van der Waals materials as semi-transparent interlayers that enable epitaxy and release of epitaxial layers at the 2D layer interface. Although the principle of remote epitaxy is simple, it is often challenging to perform owing to stringent requirements for sample preparation and procedure control. This Primer provides extensive guidelines on remote epitaxy techniques, from preparing 2D materials to epitaxy processes and layer transfer methods. Depending on the material of interest, the procedure used can vary, which affects the quality. Consequently, in this Primer, key considerations and characterization techniques are provided for respective families of materials. These are intended as a stepping stone to expand the available material choice and improve the quality of materials grown by remote epitaxy. Lastly, the current limitations, possible solutions and future directions of remote epitaxy and its applications are discussed. 2024-02-27T21:21:57Z 2024-02-27T21:21:57Z 2022-06-01 2024-02-27T21:15:16Z Article http://purl.org/eprint/type/JournalArticle 2662-8449 https://hdl.handle.net/1721.1/153597 Kim, H., Chang, C.S., Lee, S. et al. Remote epitaxy. Nat Rev Methods Primers 2, 40 (2022). en 10.1038/s43586-022-00122-w Nature Reviews Methods Primers Creative Commons Attribution https://creativecommons.org/licenses/by/4.0/ application/pdf Springer Science and Business Media LLC Springer Nature |
| spellingShingle | General Medicine General Biochemistry, Genetics and Molecular Biology Kim, Hyunseok Chang, Celesta S. Lee, Sangho Jiang, Jie Jeong, Junseok Park, Minseong Meng, Yuan Ji, Jongho Kwon, Yeunwoo Sun, Xuechun Kong, Wei Kum, Hyun S. Bae, Sang-Hoon Lee, Kyusang Hong, Young Joon Shi, Jian Kim, Jeehwan Remote epitaxy |
| title | Remote epitaxy |
| title_full | Remote epitaxy |
| title_fullStr | Remote epitaxy |
| title_full_unstemmed | Remote epitaxy |
| title_short | Remote epitaxy |
| title_sort | remote epitaxy |
| topic | General Medicine General Biochemistry, Genetics and Molecular Biology |
| url | https://hdl.handle.net/1721.1/153597 |
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