Reticle Stage Actuation Concepts for High Acceleration Trajectories in Next-generation Photolithography Tools
In photolithography scanning tools, the functional patterns of integrated circuit layers are defined with critical dependence on the actuation of reticle and wafer stages along precisely synchronized trajectories. Patterning throughput of such tools is limited based on the velocity and acceleration...
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| Format: | Thesis |
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Massachusetts Institute of Technology
2024
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| Online Access: | https://hdl.handle.net/1721.1/154363 |