Chemical vapor deposition of fluorocarbon films for low dielectric constant thin film applications

Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2000.

Bibliographic Details
Main Author:	Lau, Kenneth Ka Shun, 1972-
Other Authors:	Karen K. Gleason.
Format:	Thesis
Language:	eng
Published:	Massachusetts Institute of Technology 2005
Subjects:	Chemical Engineering.
Online Access:	http://hdl.handle.net/1721.1/16748

Internet

http://hdl.handle.net/1721.1/16748