Chemical vapor deposition of fluorocarbon films for low dielectric constant thin film applications

Míreanna comhchosúla

• Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications
  de réir: Labelle, Catherine B., 1972-
  Foilsithe / Cruthaithe: (2014)
• Chemical vapor deposition and functionalization of fluorocarbon-organosilicon copolymer thin films
  de réir: Murthy, Shashi Krishna, 1977-
  Foilsithe / Cruthaithe: (2005)
• Chemical vapor deposition of organosilicon composite thin films for porous low-k dielectrics
  de réir: Ross, April Denise, 1977-
  Foilsithe / Cruthaithe: (2007)
• Chemical vapor deposition thin films as biopassivation coatings and directly patternable dielectrics
  de réir: Pryce Lewis, Hilton G. (Hilton Gavin), 1973-
  Foilsithe / Cruthaithe: (2005)
• Pulsed-plasma chemical vapor deposition of organosilicon thin films for dielectric applications
  de réir: Burkey, Daniel D
  Foilsithe / Cruthaithe: (2005)