Maskless nanolithography and imaging with diffractive optical arrays
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2003.
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Format: | Thesis |
Sprog: | eng |
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Massachusetts Institute of Technology
2005
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Online adgang: | http://hdl.handle.net/1721.1/18066 |
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author | Gil, Darío, 1975- |
author2 | Henry I. Smith. |
author_facet | Henry I. Smith. Gil, Darío, 1975- |
author_sort | Gil, Darío, 1975- |
collection | MIT |
description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2003. |
first_indexed | 2024-09-23T08:41:20Z |
format | Thesis |
id | mit-1721.1/18066 |
institution | Massachusetts Institute of Technology |
language | eng |
last_indexed | 2024-09-23T08:41:20Z |
publishDate | 2005 |
publisher | Massachusetts Institute of Technology |
record_format | dspace |
spelling | mit-1721.1/180662019-04-09T19:13:52Z Maskless nanolithography and imaging with diffractive optical arrays Gil, Darío, 1975- Henry I. Smith. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Electrical Engineering and Computer Science. Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2003. Includes bibliographical references (p. 221-228). Semiconductor lithography is at a crossroads. With mask set costs in excess of one million dollars, long mask turn-around times, and tools that are characterized by their inflexibility and skyrocketing costs, there is a need for a new paradigm in lithography. The work presented in this thesis, Zone-Plate-Array Lithography (ZPAL), bypasses some of the most pressing problems of current lithography equipment by developing a maskless lithography tool that will be scalable, flexible and cost-effective. It is the departure from a century-old tradition of refractive optics, in combination with the use of advanced micromechanics and fast computing, that enables ZPAL to open up a new application space in lithography. This thesis addresses in detail all levels of the ZPAL system, from the micromechanics, to the diffractive optics, to the control system. Special emphasis is placed on the design, fabrication and characterization of high-numerical-aperture diffractive optical elements for lithography and imaging. The results achieved provide conclusive evidence that diffractive optics in general, and zone plates in particular, are capable of state-of-the-art lithography. by Darío Gil. Ph.D. 2005-06-02T19:50:24Z 2005-06-02T19:50:24Z 2003 2003 Thesis http://hdl.handle.net/1721.1/18066 57518316 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 228 p. 13382470 bytes 13412299 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology |
spellingShingle | Electrical Engineering and Computer Science. Gil, Darío, 1975- Maskless nanolithography and imaging with diffractive optical arrays |
title | Maskless nanolithography and imaging with diffractive optical arrays |
title_full | Maskless nanolithography and imaging with diffractive optical arrays |
title_fullStr | Maskless nanolithography and imaging with diffractive optical arrays |
title_full_unstemmed | Maskless nanolithography and imaging with diffractive optical arrays |
title_short | Maskless nanolithography and imaging with diffractive optical arrays |
title_sort | maskless nanolithography and imaging with diffractive optical arrays |
topic | Electrical Engineering and Computer Science. |
url | http://hdl.handle.net/1721.1/18066 |
work_keys_str_mv | AT gildario1975 masklessnanolithographyandimagingwithdiffractiveopticalarrays |