Fabrication and characterization of nanostructures from self-assembled block copolymers

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2003.

Bibliographic Details
Main Author: Cheng, Joy, 1974-
Other Authors: Caroline A. Ross.
Format: Thesis
Language:eng
Published: Massachusetts Institute of Technology 2006
Subjects:
Online Access:http://hdl.handle.net/1721.1/29963
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author Cheng, Joy, 1974-
author2 Caroline A. Ross.
author_facet Caroline A. Ross.
Cheng, Joy, 1974-
author_sort Cheng, Joy, 1974-
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description Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2003.
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spelling mit-1721.1/299632019-04-12T21:40:03Z Fabrication and characterization of nanostructures from self-assembled block copolymers Cheng, Joy, 1974- Caroline A. Ross. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Materials Science and Engineering. Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2003. Includes bibliographical references (leaf 109). Nanoscale magnetic dot arrays have attracted considerable interest, both for fundamental studies of micromagnetism and for possible applications in high-density magnetic data storage. Self-assembled block copolymers provide an alternative nanolithography technique to fabricate large-area nanomagnet arrays. Block copolymer thin films that micro-phase separate into periodic domains can be used as templates to define arrays of close-packed nanostructure, using a series of etching steps. Using polystyrene-polyferrocenyldimethyl-silane (PS-PFS), large-area polymer dots, silica dots and magnetic dots with periods of 56 nm were made using a series of plasma etching steps. Magnetometry techniques are used to characterize the bulk magnetic behavior of the dot arrays of Co, NiFe and pseudo spin valve structures. These dot arrays show strong magnetostatic interaction between the dots and within the dots. The self-assembly process is simple and low cost, however, the block copolymers typically have uncontrolled defects and lack long-range order. A topographically patterned substrate is used to guide the phase-separation in a subsequently deposited block copolymer film. The lateral dimensions of the patterns in the substrates, and interfacial interactions, are key factors in the ordering mechanism. Well-ordered block copolymer structures can be achieved under proper confinement conditions. In addition, the position of the polymer microdomains and defects in the array such as dislocations can be purposefully controlled by the design of the topographical guiding features. Combining topographic confinement with block copolymer lithographic methods will enable large-area ordered functional dot arrays to be made for various applications. by Joy Cheng. Ph.D. 2006-03-24T18:07:00Z 2006-03-24T18:07:00Z 2003 2003 Thesis http://hdl.handle.net/1721.1/29963 54763303 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 109 p. 11638378 bytes 19891122 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology
spellingShingle Materials Science and Engineering.
Cheng, Joy, 1974-
Fabrication and characterization of nanostructures from self-assembled block copolymers
title Fabrication and characterization of nanostructures from self-assembled block copolymers
title_full Fabrication and characterization of nanostructures from self-assembled block copolymers
title_fullStr Fabrication and characterization of nanostructures from self-assembled block copolymers
title_full_unstemmed Fabrication and characterization of nanostructures from self-assembled block copolymers
title_short Fabrication and characterization of nanostructures from self-assembled block copolymers
title_sort fabrication and characterization of nanostructures from self assembled block copolymers
topic Materials Science and Engineering.
url http://hdl.handle.net/1721.1/29963
work_keys_str_mv AT chengjoy1974 fabricationandcharacterizationofnanostructuresfromselfassembledblockcopolymers