Nano-contact printing of DNA monolayers

Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2005.

Bibliographic Details
Main Author: Tong, Angela, 1983-
Other Authors: Francesco Stellacci.
Format: Thesis
Language:eng
Published: Massachusetts Institute of Technology 2006
Subjects:
Online Access:http://hdl.handle.net/1721.1/32856
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author Tong, Angela, 1983-
author2 Francesco Stellacci.
author_facet Francesco Stellacci.
Tong, Angela, 1983-
author_sort Tong, Angela, 1983-
collection MIT
description Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2005.
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spelling mit-1721.1/328562019-04-12T09:09:43Z Nano-contact printing of DNA monolayers Nano-contact printing of deoxyribonucleic acid monolayers Tong, Angela, 1983- Francesco Stellacci. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Materials Science and Engineering. Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2005. Includes bibliographical references (leaf 23). Technology today is directed towards building smaller devices. To accommodate this development, printing methods are needed. Some printing methods that are used include lithography, micro-contact printing, and inkjet printing. These methods all require specialized instrumentation, hazardous chemicals, and complicated and tedious steps that increase cost of manufacturing. Nano-contact printing is an alternative solution which relies on the specificity of DNA to direct molecules into precise patterns. This study attempts to find the limitations of nano-contact printing through the printing of oligonucleotide monolayers. Eight pattern transfers were made with one master copy and the oligonucleotide surface coverage was analyzed using tapping mode atomic force microscopy (AFM). The percent coverage of oligonucleotide was then calculated from the tapping mode AFM phase images. Two general trends were found. The oligonucleotide surface coverage on the master increased slightly, while the surface coverage on the pattern transfers decreased. One possible explanation for the trends is that the decrease in contact between master and secondary substrate is due to both the accumulation of dirt and the wear and tear of' the master. By improving the contact between master and secondary substrate, the printing method can be expanded from printing monolayers to high resolution patterns. by Angela Tong. S.B. 2006-05-15T20:34:58Z 2006-05-15T20:34:58Z 2005 2005 Thesis http://hdl.handle.net/1721.1/32856 61490376 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 23 leaves 991795 bytes 989950 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology
spellingShingle Materials Science and Engineering.
Tong, Angela, 1983-
Nano-contact printing of DNA monolayers
title Nano-contact printing of DNA monolayers
title_full Nano-contact printing of DNA monolayers
title_fullStr Nano-contact printing of DNA monolayers
title_full_unstemmed Nano-contact printing of DNA monolayers
title_short Nano-contact printing of DNA monolayers
title_sort nano contact printing of dna monolayers
topic Materials Science and Engineering.
url http://hdl.handle.net/1721.1/32856
work_keys_str_mv AT tongangela1983 nanocontactprintingofdnamonolayers
AT tongangela1983 nanocontactprintingofdeoxyribonucleicacidmonolayers