Development of an immersion maskless lithography system
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2005.
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| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2006
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| Online Access: | http://hdl.handle.net/1721.1/34371 |
| _version_ | 1811003015959674880 |
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| author | Chao, David, Ph. D. Massachusetts Institute of Technology |
| author2 | Henry I. Smith. |
| author_facet | Henry I. Smith. Chao, David, Ph. D. Massachusetts Institute of Technology |
| author_sort | Chao, David, Ph. D. Massachusetts Institute of Technology |
| collection | MIT |
| description | Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2005. |
| first_indexed | 2024-09-23T15:57:43Z |
| format | Thesis |
| id | mit-1721.1/34371 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T15:57:43Z |
| publishDate | 2006 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/343712019-04-11T02:02:18Z Development of an immersion maskless lithography system Chao, David, Ph. D. Massachusetts Institute of Technology Henry I. Smith. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Electrical Engineering and Computer Science. Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2005. Includes bibliographical references (p. 85-87). As lithography quickly approaches its limits with current technologies, a host of new ideas is being proposed in hopes of pushing lithography to new levels of performance. The work presented in this thesis explores the use of an immersion scheme to improve the performance of a maskless lithographic technique known as Zone-Plate-Array Lithography (ZPAL). This is believed to be the first implementation of an immersion scheme in a maskless lithography system. This thesis provides a complete description of the Immersion Zone-Plate-Array Lithography (iZPAL) system. Since the zone plate component of the system is largely responsible for its lithographic performance, a thorough analysis of zone plate theory, design, and fabrication is also presented. The focusing performance of an immersion zone plate is then characterized through the experimental reconstruction of its point spread function. Finally, lithography results obtained with the iZPAL system are compared to those obtained with the non-immersion ZPAL system, demonstrating the improvement in resolution, exposure latitude, and depth-of-focus achieved with the immersion scheme. by David Chao. S.M. 2006-11-07T11:49:33Z 2006-11-07T11:49:33Z 2005 2005 Thesis http://hdl.handle.net/1721.1/34371 70079655 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 87 p. 4995090 bytes 4999207 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology |
| spellingShingle | Electrical Engineering and Computer Science. Chao, David, Ph. D. Massachusetts Institute of Technology Development of an immersion maskless lithography system |
| title | Development of an immersion maskless lithography system |
| title_full | Development of an immersion maskless lithography system |
| title_fullStr | Development of an immersion maskless lithography system |
| title_full_unstemmed | Development of an immersion maskless lithography system |
| title_short | Development of an immersion maskless lithography system |
| title_sort | development of an immersion maskless lithography system |
| topic | Electrical Engineering and Computer Science. |
| url | http://hdl.handle.net/1721.1/34371 |
| work_keys_str_mv | AT chaodavidphdmassachusettsinstituteoftechnology developmentofanimmersionmasklesslithographysystem |