Interferometric-spatial-phase imaging for sub-nanometer three-dimensional positioning
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2004.
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Format: | Thesis |
Language: | eng |
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Massachusetts Institute of Technology
2006
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Online Access: | http://hdl.handle.net/1721.1/34563 |
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author | Moon, Euclid E. (Euclid Eberle), 1965- |
author2 | Henry I. Smith. |
author_facet | Henry I. Smith. Moon, Euclid E. (Euclid Eberle), 1965- |
author_sort | Moon, Euclid E. (Euclid Eberle), 1965- |
collection | MIT |
description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2004. |
first_indexed | 2024-09-23T15:49:43Z |
format | Thesis |
id | mit-1721.1/34563 |
institution | Massachusetts Institute of Technology |
language | eng |
last_indexed | 2024-09-23T15:49:43Z |
publishDate | 2006 |
publisher | Massachusetts Institute of Technology |
record_format | dspace |
spelling | mit-1721.1/345632019-04-10T12:50:22Z Interferometric-spatial-phase imaging for sub-nanometer three-dimensional positioning Moon, Euclid E. (Euclid Eberle), 1965- Henry I. Smith. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. Electrical Engineering and Computer Science. Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2004. Includes bibliographical references (p. 203-206). Current alignment technology is incapable of satisfying the needs of imminent generations of lithography. This dissertation delineates a novel method of alignment and three-dimensional position metrology that is compatible with many forms of proximity lithography. The method is called Interferometric-Spatial-Phase Imaging (ISPI), and is based on encoding three-dimensional position information in the spatial phase and frequency of interference fringes, viewed with specialized oblique-incidence, dark-field optical microscopes. Alignment detectivity is <0.5 nm, and detection range is >500 gm. Unlike amplitude-based interferometers, this spatial-phase-encoding interferometer achieves high alignment detectivity without sensitivity to variations in wavelength, gap and other factors, such as resist layers and changes in the index of refraction in the beampath. Several novel gap detection methods are introduced, with gap detectivity <1 nm, measured over gaps between <1 am and >500 jgm. (cont.) Gap is confirmed with exposure of patterns in resist, taking advantage of near-field interference in a novel Chirped Talbot Effect. Alignment and pattern overlay are confirmed in experiments combining x-ray exposures with continuous ISPI position feedback. Dynamic overlay of patterns in resist is demonstrated to be 2.7 nm, with a clear path for further improvement. Gate structures in a double-gate MOSFET are dynamically aligned to 2.5 nm. by Euclid Eberle Moon. Ph.D. 2006-11-07T12:58:27Z 2006-11-07T12:58:27Z 2004 2004 Thesis http://hdl.handle.net/1721.1/34563 71151326 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 206 p. 55784965 bytes 55784278 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology |
spellingShingle | Electrical Engineering and Computer Science. Moon, Euclid E. (Euclid Eberle), 1965- Interferometric-spatial-phase imaging for sub-nanometer three-dimensional positioning |
title | Interferometric-spatial-phase imaging for sub-nanometer three-dimensional positioning |
title_full | Interferometric-spatial-phase imaging for sub-nanometer three-dimensional positioning |
title_fullStr | Interferometric-spatial-phase imaging for sub-nanometer three-dimensional positioning |
title_full_unstemmed | Interferometric-spatial-phase imaging for sub-nanometer three-dimensional positioning |
title_short | Interferometric-spatial-phase imaging for sub-nanometer three-dimensional positioning |
title_sort | interferometric spatial phase imaging for sub nanometer three dimensional positioning |
topic | Electrical Engineering and Computer Science. |
url | http://hdl.handle.net/1721.1/34563 |
work_keys_str_mv | AT mooneuclideeuclideberle1965 interferometricspatialphaseimagingforsubnanometerthreedimensionalpositioning |