Real time interferometric imaging of the plasma etch process
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1994.
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Format: | Thesis |
Language: | eng |
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Massachusetts Institute of Technology
2007
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Online Access: | http://hdl.handle.net/1721.1/35386 |
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author | Claman, Jonathan L. (Jonathan Leonard) |
author2 | Duane S. Boning. |
author_facet | Duane S. Boning. Claman, Jonathan L. (Jonathan Leonard) |
author_sort | Claman, Jonathan L. (Jonathan Leonard) |
collection | MIT |
description | Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1994. |
first_indexed | 2024-09-23T14:39:57Z |
format | Thesis |
id | mit-1721.1/35386 |
institution | Massachusetts Institute of Technology |
language | eng |
last_indexed | 2024-09-23T14:39:57Z |
publishDate | 2007 |
publisher | Massachusetts Institute of Technology |
record_format | dspace |
spelling | mit-1721.1/353862019-04-11T05:54:30Z Real time interferometric imaging of the plasma etch process Claman, Jonathan L. (Jonathan Leonard) Duane S. Boning. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science Electrical Engineering and Computer Science Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1994. Includes bibliographical references (leaves 51-52). by Jonathan L. Claman. M.Eng. 2007-01-10T15:59:26Z 2007-01-10T15:59:26Z 1994 1994 Thesis http://hdl.handle.net/1721.1/35386 31162756 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 iv, 72 leaves 3838363 bytes 3841561 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology |
spellingShingle | Electrical Engineering and Computer Science Claman, Jonathan L. (Jonathan Leonard) Real time interferometric imaging of the plasma etch process |
title | Real time interferometric imaging of the plasma etch process |
title_full | Real time interferometric imaging of the plasma etch process |
title_fullStr | Real time interferometric imaging of the plasma etch process |
title_full_unstemmed | Real time interferometric imaging of the plasma etch process |
title_short | Real time interferometric imaging of the plasma etch process |
title_sort | real time interferometric imaging of the plasma etch process |
topic | Electrical Engineering and Computer Science |
url | http://hdl.handle.net/1721.1/35386 |
work_keys_str_mv | AT clamanjonathanljonathanleonard realtimeinterferometricimagingoftheplasmaetchprocess |