Fabrication of distributed feeback devices using X-ray lithography

Fabrication of distributed feeback devices using X-ray lithography

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995.

Bibliografiske detaljer
Hovedforfatter:	Wong, Vincent V
Andre forfattere:	Henry I. Smith.
Format:	Thesis
Sprog:	eng
Udgivet:	Massachusetts Institute of Technology 2007
Fag:	Electrical Engineering and Computer Science
Online adgang:	http://hdl.handle.net/1721.1/37789

Lignende værker

Aligned T-gate, fabrication using X-ray lithography
af: Meinhold, Mitchell W., 1972-
Udgivet: (2008)

Development of X-ray lithography and nanofabrication techniques for III-V optical devices
af: Lim, Michael H. (Michael Hong)
Udgivet: (2005)

Sub-50nm x-ray lithography with application to a coupled quantum dot device
af: Carter, David John Donat, 1966-
Udgivet: (2009)

Optical and mechanical characterization of thin membranes for X-ray lithography
af: Owen, Gabrielle M. (Gabrielle Marie)
Udgivet: (2006)

Distortion analysis on an improved mask technology for X-ray lithography
af: Pipe, Kevin P. (Kevin Patrick), 1976-
Udgivet: (2013)

Optimization of image formation in X-ray lithography using rigorous electromagnetic theory and experiments
af: Hector, Scott D. (Scott Daniel)
Udgivet: (2005)

Experimental characterization and physical modeling of resolution limits in proximity printing x-ray lithography
af: Early, Kathleen
Udgivet: (2005)

Epitaxy and X-ray lithography of silicon germanium semiconductors
af: Wong, Terence Kin Shun.
Udgivet: (2008)

Demonstration lithography using plasma focus soft x-ray source
af: Lee, Sing, et al.
Udgivet: (2008)

Fabrication of large-area 100 nm-period gratings using achromatic holographic lithography
af: Yen, Anthony
Udgivet: (2005)

Gold-electroplating technology for X-ray-mask fabrication
af: Yee, Kenneth W. (Kenneth Wee-Koon)
Udgivet: (2008)

Plasma radiation sources for X-ray lithography and neutron analysis applications
af: Lee, Sing, et al.
Udgivet: (2008)

Fabrication of distortion free x-ray masks using low stress tungsten
af: Ku, Yao-Ching
Udgivet: (2007)

Design feeback PI controller for DC motor drives using cascade control structure /
af: 243371 Mohd. Fadzli Mohd. Sunif
Udgivet: (2006)

Interferometric lithography and selected applications
af: Farhoud, Maya S. (Maya Sami)
Udgivet: (2005)

Absorbance modulation optical lithography
af: Tsai, Hsin-Yu Sidney
Udgivet: (2009)

Beam alignment and image metrology for scanning beam interference lithography : fabricating gratings with nanometer phase accuracy
af: Chen, Carl Gang, 1972-
Udgivet: (2005)

Towards in-situ device fabrication : electrostatic lithography and nanowire field effect devices
af: Agnihotri, Vikrant, 1981-
Udgivet: (2006)

X-ray lithographic alignment and overlay applied to double-gate MOSFET fabrication
af: Meinhold, Mitchell W., 1972-
Udgivet: (2005)

Nanostructuring magnetic thin films using interference lithography
af: Walsh, Michael E. (Michael Edward), 1975-
Udgivet: (2005)

Development of an immersion maskless lithography system
af: Chao, David, Ph. D. Massachusetts Institute of Technology
Udgivet: (2006)

Diffractive optics for maskless lithography and imaging
af: Menon, Rajesh, 1976-
Udgivet: (2005)

Refining the process of achromatic holographic lithography
af: Olster, Daniel B
Udgivet: (2005)

Nanometer-scale placement in electron-beam lithography
af: Ferrera, Juan (Ferrera Uranga)
Udgivet: (2005)

Zone plate array lithography in the deep UV
af: Djomehri, Ihsan Jahed, 1976-
Udgivet: (2005)

The effects of feature geometry on simulating nanoimprint lithography
af: GoGwilt, Cai P. (Cai Peter)
Udgivet: (2011)

Plasma soft X-ray source for microelectronic lithography
af: Zhang, Gui Xin
Udgivet: (2011)

Microcomb fabrication for high accuracy foil x-ray telescope assembly and vector Gaussian beam modeling
af: Chen, Carl Gang, 1972-
Udgivet: (2013)

Toward nano-accuracy in scanning beam interference lithography
af: Montoya, Juan, 1976-
Udgivet: (2007)

Sub-10-nm lithography with light-ion beams
af: Winston, Donald, Ph. D. Massachusetts Institute of Technology
Udgivet: (2012)

Achieving sub-10-nm resolution using scanning electron beam lithography
af: Cord, Bryan M. (Bryan Michael), 1980-
Udgivet: (2010)

An aligner for X-ray nanolithography
af: Moel Modiano, Alberto
Udgivet: (2005)

Zone Plate Array Lithography (ZPAL) : simulations and system design
af: Menon, Rajesh, 1976-
Udgivet: (2014)

Maskless parallel patterning with zone plate array lithography (ZPAL)
af: Gil, Darío, 1975-
Udgivet: (2014)

Resolution limits and process latitude of comformable contact nano-lithography
af: Fucetola, Corey Patrick
Udgivet: (2008)

Real-time spatial-phase-locked electron-beam lithography
af: Zhang, Feng, 1973-
Udgivet: (2008)

Nanometer-precision electron-beam lithography with applications in integrated optics
af: Hastings, Jeffrey Todd, 1975-
Udgivet: (2006)

A white light interferometer for improved achromatic holographic lithography
af: Shah, Satyen N. (Satyen Navin)
Udgivet: (2005)

Fabrication of periodic square arrays by angle-resolved nanosphere lithography
af: Lee, Kwang Hong, et al.
Udgivet: (2011)

Fabrication and characterization of carbon nanocomposite based field emission X-ray devices
af: Yu, Siu Fung., et al.
Udgivet: (2012)