Effect of Pt on agglomeration and Ge out-diffusion in Ni(Pt) germanosilicide

The effect of Ni and Ni(Pt) alloy with ~5 and 10 at. % Pt on the agglomeration and Ge out-diffusion in Nickel germanosilicide formed on Si₀.₇₅Ge₀.₂₅(100) has been studied. A remarkable improvement in the agglomeration behavior with in...

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Principais autores: Jin, Lijuan, Pey, Kin Leong, Choi, Wee Kiong, Fitzgerald, Eugene A., Antoniadis, Dimitri A., Chi, D.Z.
Formato: Artigo
Idioma:en_US
Publicado em: 2003
Assuntos:
Acesso em linha:http://hdl.handle.net/1721.1/3825
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author Jin, Lijuan
Pey, Kin Leong
Choi, Wee Kiong
Fitzgerald, Eugene A.
Antoniadis, Dimitri A.
Chi, D.Z.
author_facet Jin, Lijuan
Pey, Kin Leong
Choi, Wee Kiong
Fitzgerald, Eugene A.
Antoniadis, Dimitri A.
Chi, D.Z.
author_sort Jin, Lijuan
collection MIT
description The effect of Ni and Ni(Pt) alloy with ~5 and 10 at. % Pt on the agglomeration and Ge out-diffusion in Nickel germanosilicide formed on Si₀.₇₅Ge₀.₂₅(100) has been studied. A remarkable improvement in the agglomeration behavior with increasing Pt atomic percentage is observed by sheet resistance measurements and scanning electron microscopy (SEM). In addition, x-ray diffraction (XRD) shows that only NiSiGe or Ni(Pt)SiGe phase exists from 400 to 800°C. However, Ge out-diffusion from the monogermanosilicide grains is obvious at 600°C and 700°C for Ni/SiGe and Ni(Pt)(Pt at.%~10%)/SiGe, respectively, evident by XRD and micro-Raman spectroscopy. The improved melting temperature of Ni(Pt)SiGe solution compared to that of NiSiGe is the likely reason of seeing better surface morphology and suppressing Ge out-diffusion of the germanosilicide grains observed.
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spelling mit-1721.1/38252019-04-10T21:09:14Z Effect of Pt on agglomeration and Ge out-diffusion in Ni(Pt) germanosilicide Jin, Lijuan Pey, Kin Leong Choi, Wee Kiong Fitzgerald, Eugene A. Antoniadis, Dimitri A. Chi, D.Z. agglomeration Ge out-diffusion The effect of Ni and Ni(Pt) alloy with ~5 and 10 at. % Pt on the agglomeration and Ge out-diffusion in Nickel germanosilicide formed on Si₀.₇₅Ge₀.₂₅(100) has been studied. A remarkable improvement in the agglomeration behavior with increasing Pt atomic percentage is observed by sheet resistance measurements and scanning electron microscopy (SEM). In addition, x-ray diffraction (XRD) shows that only NiSiGe or Ni(Pt)SiGe phase exists from 400 to 800°C. However, Ge out-diffusion from the monogermanosilicide grains is obvious at 600°C and 700°C for Ni/SiGe and Ni(Pt)(Pt at.%~10%)/SiGe, respectively, evident by XRD and micro-Raman spectroscopy. The improved melting temperature of Ni(Pt)SiGe solution compared to that of NiSiGe is the likely reason of seeing better surface morphology and suppressing Ge out-diffusion of the germanosilicide grains observed. Singapore-MIT Alliance (SMA) 2003-12-13T16:23:54Z 2003-12-13T16:23:54Z 2004-01 Article http://hdl.handle.net/1721.1/3825 en_US Advanced Materials for Micro- and Nano-Systems (AMMNS); 1019837 bytes application/pdf application/pdf
spellingShingle agglomeration
Ge out-diffusion
Jin, Lijuan
Pey, Kin Leong
Choi, Wee Kiong
Fitzgerald, Eugene A.
Antoniadis, Dimitri A.
Chi, D.Z.
Effect of Pt on agglomeration and Ge out-diffusion in Ni(Pt) germanosilicide
title Effect of Pt on agglomeration and Ge out-diffusion in Ni(Pt) germanosilicide
title_full Effect of Pt on agglomeration and Ge out-diffusion in Ni(Pt) germanosilicide
title_fullStr Effect of Pt on agglomeration and Ge out-diffusion in Ni(Pt) germanosilicide
title_full_unstemmed Effect of Pt on agglomeration and Ge out-diffusion in Ni(Pt) germanosilicide
title_short Effect of Pt on agglomeration and Ge out-diffusion in Ni(Pt) germanosilicide
title_sort effect of pt on agglomeration and ge out diffusion in ni pt germanosilicide
topic agglomeration
Ge out-diffusion
url http://hdl.handle.net/1721.1/3825
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