TiNi-based thin films for MEMS applications
In this paper, some critical issues and problems in the development of TiNi thin films were discussed, including preparation and characterization considerations, residual stress and adhesion, frequency improvement, fatigue and stability, as well as functionally graded or composite thin film design....
Main Authors: | , , , , |
---|---|
Format: | Article |
Language: | en_US |
Published: |
2003
|
Subjects: | |
Online Access: | http://hdl.handle.net/1721.1/3844 |
_version_ | 1826209434424049664 |
---|---|
author | Fu, Yongqing Du, Hejun Huang, Weimin Zhang, Sam Hu, Min |
author_facet | Fu, Yongqing Du, Hejun Huang, Weimin Zhang, Sam Hu, Min |
author_sort | Fu, Yongqing |
collection | MIT |
description | In this paper, some critical issues and problems in the development of TiNi thin films were discussed, including preparation and characterization considerations, residual stress and adhesion, frequency improvement, fatigue and stability, as well as functionally graded or composite thin film design. Different types of MEMS applications were reviewed and the prospects for future advances in fabrication process and device development were discussed. |
first_indexed | 2024-09-23T14:22:28Z |
format | Article |
id | mit-1721.1/3844 |
institution | Massachusetts Institute of Technology |
language | en_US |
last_indexed | 2024-09-23T14:22:28Z |
publishDate | 2003 |
record_format | dspace |
spelling | mit-1721.1/38442019-04-12T08:07:22Z TiNi-based thin films for MEMS applications Fu, Yongqing Du, Hejun Huang, Weimin Zhang, Sam Hu, Min shape-memory TiNi sputtering thin films MEMS microactuator microsensor In this paper, some critical issues and problems in the development of TiNi thin films were discussed, including preparation and characterization considerations, residual stress and adhesion, frequency improvement, fatigue and stability, as well as functionally graded or composite thin film design. Different types of MEMS applications were reviewed and the prospects for future advances in fabrication process and device development were discussed. Singapore-MIT Alliance (SMA) 2003-12-13T17:59:05Z 2003-12-13T17:59:05Z 2004-01 Article http://hdl.handle.net/1721.1/3844 en_US Advanced Materials for Micro- and Nano-Systems (AMMNS); 297584 bytes application/pdf application/pdf |
spellingShingle | shape-memory TiNi sputtering thin films MEMS microactuator microsensor Fu, Yongqing Du, Hejun Huang, Weimin Zhang, Sam Hu, Min TiNi-based thin films for MEMS applications |
title | TiNi-based thin films for MEMS applications |
title_full | TiNi-based thin films for MEMS applications |
title_fullStr | TiNi-based thin films for MEMS applications |
title_full_unstemmed | TiNi-based thin films for MEMS applications |
title_short | TiNi-based thin films for MEMS applications |
title_sort | tini based thin films for mems applications |
topic | shape-memory TiNi sputtering thin films MEMS microactuator microsensor |
url | http://hdl.handle.net/1721.1/3844 |
work_keys_str_mv | AT fuyongqing tinibasedthinfilmsformemsapplications AT duhejun tinibasedthinfilmsformemsapplications AT huangweimin tinibasedthinfilmsformemsapplications AT zhangsam tinibasedthinfilmsformemsapplications AT humin tinibasedthinfilmsformemsapplications |