Non-perfluorocompound chemistries for plasma etching of dielectrics
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996.
Main Author: | Tao, Benjamin A. (Benjamin Albert) |
---|---|
Other Authors: | L. Rafael Reif. |
Format: | Thesis |
Language: | eng |
Published: |
Massachusetts Institute of Technology
2008
|
Subjects: | |
Online Access: | http://hdl.handle.net/1721.1/40603 |
Similar Items
-
Non-perfluorocompound chemistries for dielectric etching applications
by: Pruette, Laura C. (Laura Catherine), 1974-
Published: (2009) -
Characterization of perfluorocompound emission and abatement kinetics in plasma processes
by: Mohindra, Vivek
Published: (2005) -
Development of novel alternative chemistry processes for dielectric etch applications
by: Karecki, Simon Martin
Published: (2005) -
Surface kinetics modeling of silicon oxide etching in fluorocarbon plasmas
by: Kwon, Ohseung, 1969-
Published: (2005) -
Evaluation of unsaturated fluorocarbons for dielectric Etch applications
by: Chatterjee, Ritwik, 1974-
Published: (2014)