Characterization of low k CVD deposited interlayer dielectrics for integrated circuits
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997.
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| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2009
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| Online Access: | http://hdl.handle.net/1721.1/46100 |
| _version_ | 1811078701987659776 |
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| author | Harker, Marnie L. (Marnie Lynn), 1974- |
| author2 | Karen K. Gleason. |
| author_facet | Karen K. Gleason. Harker, Marnie L. (Marnie Lynn), 1974- |
| author_sort | Harker, Marnie L. (Marnie Lynn), 1974- |
| collection | MIT |
| description | Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997. |
| first_indexed | 2024-09-23T11:04:06Z |
| format | Thesis |
| id | mit-1721.1/46100 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T11:04:06Z |
| publishDate | 2009 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/461002019-04-10T13:22:28Z Characterization of low k CVD deposited interlayer dielectrics for integrated circuits Harker, Marnie L. (Marnie Lynn), 1974- Karen K. Gleason. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering Materials Science and Engineering Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997. Includes bibliographical references (leaves 62-66). by Marnie L. Harker. M.S. 2009-06-30T17:17:41Z 2009-06-30T17:17:41Z 1997 1997 Thesis http://hdl.handle.net/1721.1/46100 38509168 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 66 leaves application/pdf Massachusetts Institute of Technology |
| spellingShingle | Materials Science and Engineering Harker, Marnie L. (Marnie Lynn), 1974- Characterization of low k CVD deposited interlayer dielectrics for integrated circuits |
| title | Characterization of low k CVD deposited interlayer dielectrics for integrated circuits |
| title_full | Characterization of low k CVD deposited interlayer dielectrics for integrated circuits |
| title_fullStr | Characterization of low k CVD deposited interlayer dielectrics for integrated circuits |
| title_full_unstemmed | Characterization of low k CVD deposited interlayer dielectrics for integrated circuits |
| title_short | Characterization of low k CVD deposited interlayer dielectrics for integrated circuits |
| title_sort | characterization of low k cvd deposited interlayer dielectrics for integrated circuits |
| topic | Materials Science and Engineering |
| url | http://hdl.handle.net/1721.1/46100 |
| work_keys_str_mv | AT harkermarnielmarnielynn1974 characterizationoflowkcvddepositedinterlayerdielectricsforintegratedcircuits |