Lithographically directed materials assembly
We have developed a processing method that significantly reduces the number of steps necessary to yield a surface that directs block copolymer assembly. This methodology employs a single resistless lithography step that directly changes the surface energy without requiring subsequent material deposi...
| Main Authors: | , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
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The International Society for Optical Engineering
2010
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| Online Access: | http://hdl.handle.net/1721.1/52632 |
| _version_ | 1811076412797353984 |
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| author | Krohn, Keith E. Goodman, Russell B. Kingsborough, Richard P. Fedynyshyn, Theodore H. |
| author2 | Lincoln Laboratory |
| author_facet | Lincoln Laboratory Krohn, Keith E. Goodman, Russell B. Kingsborough, Richard P. Fedynyshyn, Theodore H. |
| author_sort | Krohn, Keith E. |
| collection | MIT |
| description | We have developed a processing method that significantly reduces the number of steps necessary to yield a surface that directs block copolymer assembly. This methodology employs a single resistless lithography step that directly changes the surface energy without requiring subsequent material deposition or plasma etching steps. The lithographically defined difference in surface energies acts as a template to direct diblock polymer self-assembly into low-defect periodic structures. Our newly developed lithographically directed self-assembly technique can produce sub-45 nm half pitch lines employing poly(styrene-b-methyl methacrylate) (PS-b-PMMA) and interference lithography. Once assembled into periodic lines of alternating materials, the PMMA block can be removed and the resulting polystyrene features can be used as an etch mask to transfer periodic lines-and-spaces into a silicon substrate. |
| first_indexed | 2024-09-23T10:21:22Z |
| format | Article |
| id | mit-1721.1/52632 |
| institution | Massachusetts Institute of Technology |
| language | en_US |
| last_indexed | 2024-09-23T10:21:22Z |
| publishDate | 2010 |
| publisher | The International Society for Optical Engineering |
| record_format | dspace |
| spelling | mit-1721.1/526322022-09-30T20:33:58Z Lithographically directed materials assembly Krohn, Keith E. Goodman, Russell B. Kingsborough, Richard P. Fedynyshyn, Theodore H. Lincoln Laboratory Fedynyshyn, Theodore H. Krohn, Keith E. Goodman, Russell B. Kingsborough, Richard P. Fedynyshyn, Theodore H. We have developed a processing method that significantly reduces the number of steps necessary to yield a surface that directs block copolymer assembly. This methodology employs a single resistless lithography step that directly changes the surface energy without requiring subsequent material deposition or plasma etching steps. The lithographically defined difference in surface energies acts as a template to direct diblock polymer self-assembly into low-defect periodic structures. Our newly developed lithographically directed self-assembly technique can produce sub-45 nm half pitch lines employing poly(styrene-b-methyl methacrylate) (PS-b-PMMA) and interference lithography. Once assembled into periodic lines of alternating materials, the PMMA block can be removed and the resulting polystyrene features can be used as an etch mask to transfer periodic lines-and-spaces into a silicon substrate. Defense Advanced Research Projects Agency (Air Force Contract FA8721-05-C-0002) 2010-03-16T20:00:51Z 2010-03-16T20:00:51Z 2009-03 Article http://purl.org/eprint/type/JournalArticle 0277-786X http://hdl.handle.net/1721.1/52632 Kingsborough, Richard P. et al. “Lithographically directed materials assembly.” Alternative Lithographic Technologies. Ed. Frank M. Schellenberg & Bruno M. La Fontaine. San Jose, CA, USA: SPIE, 2009. 72712D-10. © 2009 SPIE--The International Society for Optical Engineering en_US http://dx.doi.org/10.1117/12.814625 Proceedings of SPIE Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. application/pdf The International Society for Optical Engineering SPIE |
| spellingShingle | Krohn, Keith E. Goodman, Russell B. Kingsborough, Richard P. Fedynyshyn, Theodore H. Lithographically directed materials assembly |
| title | Lithographically directed materials assembly |
| title_full | Lithographically directed materials assembly |
| title_fullStr | Lithographically directed materials assembly |
| title_full_unstemmed | Lithographically directed materials assembly |
| title_short | Lithographically directed materials assembly |
| title_sort | lithographically directed materials assembly |
| url | http://hdl.handle.net/1721.1/52632 |
| work_keys_str_mv | AT krohnkeithe lithographicallydirectedmaterialsassembly AT goodmanrussellb lithographicallydirectedmaterialsassembly AT kingsboroughrichardp lithographicallydirectedmaterialsassembly AT fedynyshyntheodoreh lithographicallydirectedmaterialsassembly |