Achieving sub-10-nm resolution using scanning electron beam lithography

Achieving sub-10-nm resolution using scanning electron beam lithography

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2009.

Bibliographic Details
Main Author: Cord, Bryan M. (Bryan Michael), 1980-
Other Authors: Karl K. Berggren.
Format: Thesis
Language:eng
Published: Massachusetts Institute of Technology 2010
Subjects:
Electrical Engineering and Computer Science.
Online Access:http://hdl.handle.net/1721.1/53267

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