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author Musil, Christian
Melngailis, John
Stevens, Eugene H.
Bartelt, John
Utlaut, Mark
Post, Richard
Kellog, Edwin
Geiss, Michael W.
Mountain, Robert W.
Shedd, Gordon M.
Lezec, Henri J.
Dubner, Andrew D.
Jacobs, Jarvis B.
Lowther, Rex E.
Mahoney, Leonard J.
Antoniadis, Dimitri A.
author_facet Musil, Christian
Melngailis, John
Stevens, Eugene H.
Bartelt, John
Utlaut, Mark
Post, Richard
Kellog, Edwin
Geiss, Michael W.
Mountain, Robert W.
Shedd, Gordon M.
Lezec, Henri J.
Dubner, Andrew D.
Jacobs, Jarvis B.
Lowther, Rex E.
Mahoney, Leonard J.
Antoniadis, Dimitri A.
author_sort Musil, Christian
collection MIT
description Contains summary of research program and reports on four research projects.
first_indexed 2024-09-23T16:59:09Z
format Technical Report
id mit-1721.1/56969
institution Massachusetts Institute of Technology
language English
last_indexed 2024-09-23T16:59:09Z
publishDate 2010
publisher Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)
record_format dspace
spelling mit-1721.1/569692019-04-12T23:53:33Z Focused Ion Beam Fabrication Musil, Christian Melngailis, John Stevens, Eugene H. Bartelt, John Utlaut, Mark Post, Richard Kellog, Edwin Geiss, Michael W. Mountain, Robert W. Shedd, Gordon M. Lezec, Henri J. Dubner, Andrew D. Jacobs, Jarvis B. Lowther, Rex E. Mahoney, Leonard J. Antoniadis, Dimitri A. Focused Ion Beam Fabrication Focused Ion Beam Microsurgery of Integrated Circuits Ion Beam Assisted Deposition Fabrication of Graded Channel FET's in GaAs Fabrication of Graded Channel FET's in Si Measurement of Beam Profile Contains summary of research program and reports on four research projects. Charles Stark Draper Laboratory (Contract DL-H-225270) Hughes Research Laboratories International Business Machines, Inc. (Contract 456614) Nippon Telegraph and Telephone, Inc. U.S. Navy - Office of Naval Research (Contract N00014-84-K-0073) U.S. Department of Defense (Contract MDA903-85-C-0215) Hitachi Central Research Laboratory 2010-07-15T22:10:06Z 2010-07-15T22:10:06Z 1986-01 Technical Report RLE_PR_128_03 http://hdl.handle.net/1721.1/56969 en Massachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1986 Focused Ion Beam Fabrication Massachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 128 Copyright (c) 2008 by the Massachusetts Institute of Technology. All rights reserved. application/pdf Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)
spellingShingle Focused Ion Beam Fabrication
Focused Ion Beam Microsurgery of Integrated Circuits
Ion Beam Assisted Deposition
Fabrication of Graded Channel FET's in GaAs
Fabrication of Graded Channel FET's in Si
Measurement of Beam Profile
Musil, Christian
Melngailis, John
Stevens, Eugene H.
Bartelt, John
Utlaut, Mark
Post, Richard
Kellog, Edwin
Geiss, Michael W.
Mountain, Robert W.
Shedd, Gordon M.
Lezec, Henri J.
Dubner, Andrew D.
Jacobs, Jarvis B.
Lowther, Rex E.
Mahoney, Leonard J.
Antoniadis, Dimitri A.
Focused Ion Beam Fabrication
title Focused Ion Beam Fabrication
title_full Focused Ion Beam Fabrication
title_fullStr Focused Ion Beam Fabrication
title_full_unstemmed Focused Ion Beam Fabrication
title_short Focused Ion Beam Fabrication
title_sort focused ion beam fabrication
topic Focused Ion Beam Fabrication
Focused Ion Beam Microsurgery of Integrated Circuits
Ion Beam Assisted Deposition
Fabrication of Graded Channel FET's in GaAs
Fabrication of Graded Channel FET's in Si
Measurement of Beam Profile
url http://hdl.handle.net/1721.1/56969
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