Focused Ion Beam Fabrication

Focused Ion Beam Fabrication

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Contains reports on eight research projects.

Detalhes bibliográficos
Principais autores: Melngailis, John, Lezec, Henri J., Shepard, Mark I., Musil, Christian R., Murguia, James E., Zamani, Susan, Ismail, Khalid, Mahoney, Leonard J., Antoniadis, Dimitri A., Ro, Jaesang, Blauner, Patricia G., Butt, Yousaf, Thompson, Carl V., III, Dubner, Andrew D., Wagner, Alan, Herndon, Terry O.
Formato: Technical Report
Idioma:English
Publicado em: Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT) 2010
Assuntos:
Focused Ion Beam Fabrication
Focused Ion Beam Program
Development of Focused Ion Beam Lithography
Development of Focused Ion Beam Patterning
Frequency Tunable Gunn Diodes Fabricated by Focused Ion Beam Implantation
Field-Effect Transistors with Focused Ion Beam Implanted Channel Regions
Microstructure of Gold Films Produced by Ion Induced Deposition
Properties of Gold Films Produced by Ion Induced Deposition
Focused Ion Beam Induced Depostion of Submicrometer Structures
In-Situ Measurement of Gas Adsorption
In-Situ Measurement of Ion Induced Deposition
Planar Vias through Si₃N₄ and SiO₂ Fabricated by Focused Ion Beam Implantation
Acesso em linha:http://hdl.handle.net/1721.1/57076

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