The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films
Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2009.
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Format: | Thesis |
Language: | eng |
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Massachusetts Institute of Technology
2010
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Online Access: | http://hdl.handle.net/1721.1/58070 |
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author | Perkinson, Joy C. (Joy Clare) |
author2 | Caroline A. Ross. |
author_facet | Caroline A. Ross. Perkinson, Joy C. (Joy Clare) |
author_sort | Perkinson, Joy C. (Joy Clare) |
collection | MIT |
description | Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2009. |
first_indexed | 2024-09-23T11:08:00Z |
format | Thesis |
id | mit-1721.1/58070 |
institution | Massachusetts Institute of Technology |
language | eng |
last_indexed | 2024-09-23T11:08:00Z |
publishDate | 2010 |
publisher | Massachusetts Institute of Technology |
record_format | dspace |
spelling | mit-1721.1/580702019-04-12T15:39:49Z The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films Perkinson, Joy C. (Joy Clare) Caroline A. Ross. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Materials Science and Engineering. Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2009. Cataloged from PDF version of thesis. Includes bibliographical references (p. 35). Introduction: As the size of electronic and magnetic devices decreases, nanoscale patterning becomes an increasingly important area of research. Two different approaches have been taken to pattern media: top-down methods such as lithography, and bottom-up methods such as self-assembly. Top-down assembly methods have the advantages of precision and accuracy, but are hard to scale for certain industrial applications due to their low throughput. Self-assembly methods are more easily scalable for applications requiring mass production. Thus, self-assembly has attracted attention and is an area of ongoing research for its potential to create high-throughput, periodic nanoscale patterns. Block copolymers are a class of commonly-studied materials for nanoscale selfassembly. Block copolymers are long molecules that consist of "blocks" of chemically differing polymers attached end-to-end. Under the right conditions, these blocks will phase separate, spontaneously forming periodic microdomains. Diblock copolymers, which have only two blocks, have been found to form a variety of well-ordered morphologies with nanoscale periodicity ... by Joy C. Perkinson. S.B. 2010-09-01T16:23:40Z 2010-09-01T16:23:40Z 2009 2009 Thesis http://hdl.handle.net/1721.1/58070 630087841 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 35 p. application/pdf Massachusetts Institute of Technology |
spellingShingle | Materials Science and Engineering. Perkinson, Joy C. (Joy Clare) The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films |
title | The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films |
title_full | The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films |
title_fullStr | The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films |
title_full_unstemmed | The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films |
title_short | The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films |
title_sort | effects of polydispersity on the morphology of polystyrene polyferrocenyldimethylsilane block copolymer thin films |
topic | Materials Science and Engineering. |
url | http://hdl.handle.net/1721.1/58070 |
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