Templated self-assembly of Si-containing block copolymers for nanoscale device fabrication

Templated self-assembly of Si-containing block copolymers for nanoscale device fabrication

Block copolymers have been proposed for self-assembled nanolithography because they can spontaneously form well-ordered nanoscale periodic patterns of lines or dots in a rapid, low-cost process. By templating the selfassembly, patterns of increasing complexity can be generated, for example arrays of...

Full description

Bibliographic Details
Main Authors: Ross, Caroline A., Manners, I., Gwyther, J., Jung, Yeon Sik, Chuang, Vivian Peng-Wei, Son, Jeong Gon, Gotrik, Kevin W., Mickiewicz, R. A., Yang, Joel K. W., Chang, J. B., Berggren, Karl K.
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Format: Article
Language:en_US
Published: SPIE 2010
Online Access:http://hdl.handle.net/1721.1/58560
https://orcid.org/0000-0003-2262-1249
https://orcid.org/0000-0003-3473-446X
https://orcid.org/0000-0001-7453-9031
https://orcid.org/0000-0003-2055-4900

Internet

http://hdl.handle.net/1721.1/58560
https://orcid.org/0000-0003-2262-1249
https://orcid.org/0000-0003-3473-446X
https://orcid.org/0000-0001-7453-9031
https://orcid.org/0000-0003-2055-4900

Similar Items